Ex Parte Liu et alDownload PDFPatent Trial and Appeal BoardJul 28, 201713486185 (P.T.A.B. Jul. 28, 2017) Copy Citation United States Patent and Trademark Office UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O.Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 13/486,185 06/01/2012 Chia-Chu Liu 2012-0096 / 24061.2129 5300 42717 7590 08/01/2017 HAYNES AND BOONE, LLP IP Section 2323 Victory Avenue Suite 700 Dallas, TX 75219 EXAMINER SWAN, GARDNER W.S ART UNIT PAPER NUMBER 2892 NOTIFICATION DATE DELIVERY MODE 08/01/2017 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): ipdocketing@haynesboone.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte CHIA-CHU LIU, SHIAO-CHIAN YEH, HONG-JANG WU, and KUEI-SHUN CHEN Appeal 2016-005013 Application 13/486,185 Technology Center 2800 Before MARKNAGUMO, JAMES C. HOUSEL, and MERRELL C. CASHION, JR., Administrative Patent Judges. Opinion for the Board by HOUSEL, Administrative Patent Judge. Dissenting Opinion by NAGUMO, Administrative Patent Judge. DECISION ON APPEAL1 1 Our decision refers to the Specification (Spec.) filed June 1, 2012, the Examiner’s Final Office Action (Final Act.) dated January 16, 2015, Appellants’ Appeal Brief (App. Br.) filed September 21, 2015, the Examiner’s Answer (Ans.) dated February 10, 2016, and Appellants’ Reply Brief (Reply Br.) filed April 8, 2016. Appeal 2016-005013 Application 13/486,185 Pursuant to 35 U.S.C. § 134(a), Appellants2 appeal from the Examiner’s decision rejecting claims 1—9, 11, 12, 14, and 21—25. We have jurisdiction over the appeal under 35 U.S.C. § 6(b). We AFFIRM. STATEMENT OF THE CASE The invention relates to a semiconductor device having at least one non-orthogonal element, which Appellants define as any element that includes an inclined or slanted feature, e.g., that is not at a substantially right angle or perpendicular to a referenced feature. Spec. 1 8. Appellants further disclose that the non-orthogonal element may be the end of a gate structure that is formed by a non-orthogonal cut in the method of making the semiconductor device. Id. For example, Appellants disclose that the cut may extend across the gate structures of the device at an angle other than 90 degrees, such as approximately 45 degrees, with respect to a centerline drawn along the length of the gate structures. Id. ^ 16. Claim 1, reproduced below from the Claims Appendix to the Appeal Brief, is illustrative of the subject matter on appeal. The limitation at issue is italicized. 1. A semiconductor device, comprising: a first gate structure segment and a collinear second gate structure segment; a third gate structure segment and a collinear fourth gate structure segment; wherein the first gate structure segment has an end with a face defined by linear edges, wherein a plane extending from the face is non-orthogonal to a sidewall of the first gate 2 According to Appellants, the real party in interest is Taiwan Semiconductor Manufacturing Company, Ltd. App. Br. 3. 2 Appeal 2016-005013 Application 13/486,185 structure; spacer elements formed on a first and second sidewall of the first gate structure segment; and an interconnection structure extending from the end of the first gate structure segment to the fourth gate structure segment, wherein the interconnection structure is disposed above the first gate structure segment and the fourth gate structure segment, and wherein the interconnect structure has a planar bottom surface that extends from having an interface directly on the first gate structure across to having an interface directly on the fourth gate structure segment, and wherein the planar bottom surface of the interconnection structure is disposed directly on a top surface of the spacer elements on the first and second sidewalls of the first gate structure segment. Independent claim 7 similarly recites a semiconductor device comprising, among other things, “a plane extending from a rectangular face of an end of the second gate structure is not substantially perpendicular to sidewalls of the second gate structure.”3 Remaining independent claim 21 also similarly recites a semiconductor device comprising, among other things, “an end of the first gate structure has a face that is angled approximately 45 degrees from a centerline along a length of the gate structure.” REJECTIONS The Examiner maintains, and Appellants request our review of, the following grounds of rejection under 35 U.S.C. § 103(a): 1. Claims 1—4, 6—9, 11, 12, 14, 21, 22, and 24 as unpatentable over 3 Claim 7 also recites that the first gate structure is non-orthogonally disposed with respect to the second gate structure. However, because the second gate structure is parallel to the first gate structure, these two gate structures by definition are non-orthogonal to each other. 3 Appeal 2016-005013 Application 13/486,185 Becker4 in view of Houston,5 6 7as evidenced by Ema;6,7 and 2. Claims 5, 23, and 25 as unpatentable over Becker, Houston, and Ema, as applied to claim 1 above, and further in view of Ngo.8 ANALYSIS Appellants do not argue the claims separately, instead focusing on the substantively common limitation in each of independent claims 1,7, and 21. In accordance with the provisions of 37 C.F.R. § 41.37(c)(l)(iv) (2015), we select claim 1 to address Appellants’ arguments. The remaining claims stand or fall with claim 1. The dispositive issue before us on appeal is: Have Appellants identified reversible error in the Examiner’s determination that the non- orthogonal end face of a gate structure would have been an obvious matter of design given the teachings of Becker and Ema?9 For the reasons given by 4 US 2009/0224317 Al, published September 10, 2009. 5 US 6,737,347 Bl, issued May 18, 2004. 6 US 5,148,246, issued September 15, 1992. 7 Ema was first cited by the Examiner in the Advisory Action of April 27, 2015, in response to a challenge to the Examiner’s Official Notice in the Final Office Action, and is relied on in the Answer as evidence that gate structures with non-orthogonal end faces were known in the art. Ans. 2—8. Although the Examiner’s statement of rejection in the Final Office Action fails to include Ema, the Examiner’s statement of rejection in the Answer clearly indicates that Ema is relied on as an evidentiary teaching. Id. at 2. Appellants object (App. Br. 15), but respond on the merits, so there is no harmful error. 8 US 6,051,870, issued April 18, 2000. 9 The Examiner applies Houston for teaching various features of the claimed invention which the Examiner acknowledges are not taught by Becker. Final Act. 4. Appellants do not dispute the Examiner’s findings with regard to Houston, nor argue against the Examiner’s combination of Becker and Houston. As such, any further discussion of Houston is unnecessary. 4 Appeal 2016-005013 Application 13/486,185 the Examiner in the Final Office Action and Answer as well as below, we answer this question in the negative. We, therefore, sustain the Examiner’s obviousness rejections based on the findings of face, conclusions of law, and rebuttals to arguments well expressed by the Examiner which we adopt as our own. The following comments are added for emphasis. The Examiner finds, in pertinent part, that Becker, Figure 16C, teaches a semiconductor device having first, second, third, and fourth gate structures 401 A, 405A, 403A, 407A, wherein first and second gate structures 401 A, 405A are aligned, parallel, and spaced apart from each other, third and fourth gate structures 403A, 407A are aligned, parallel, and spaced apart from each other, with interconnect 1621 disposed over and connecting first and fourth gate structures 401A, 407A. Final Act. 2—3. The Examiner acknowledges that the end faces of Becker’s gate structures are not non-orthogonal to sidewalls thereof. Id. at 3. However, the Examiner finds that it was known in the art that these end faces have a shape. Id. The Examiner also finds the claimed shape, non-orthogonal end faces of the gate structures, was known in the art as evidenced by Ema. Ans. 2—8; see also the Advisory Action dated April 27, 2015. In addition, the Examiner finds that “[pjersuasive evidence that the claimed shape of the gate structure is significant has not been provided.” Final Act. 3. Appellants argue that the combination of Becker and Houston fails to teach the claimed shape, i.e., non-orthogonal, of the end face of the gate structure and that such a shape is not an obvious design choice. App. Br. 9— 17. In particular, Appellants contend that the claimed shape provides the benefit that the gate structures may be fabricated in a single photolithography and etching process. Id. at 12 (citing Spec. 15—20). As 5 Appeal 2016-005013 Application 13/486,185 such, Appellants urge that the Specification provides an advantage and purpose for the claimed shape. Id. at 14. Appellants further assert that the Examiner has not shown that the claimed shape was known in the art, or that the claimed shape would have performed equally well as a known alternative. Id. at 13, 14—15. In addition, Appellants argue that Ema fails to provide evidence that providing the claimed shape in Becker would have been obvious as a known alternative end face shape. App. Br. 15. Appellants assert that Ema only provides a different shape for the end face of a gate structure for a specific type of gate in a specific arrangement, that of a control gate under a floating gate where the shape at the end of a control gate is defined by the overlying floating gate. App. Br. 15; see also Reply Br. 4—5. Appellants further assert that Ema teaches the end faces of the control gate structure is defined by an isolation structure and the overlying floating gate. App. Br. 15. Appellants note that Becker does not describe a floating gate under a control gate. Id. at 16. Moreover, Appellants urge that making Becker’s end faces parallel to the isolation regions would mean that Becker’s end faces would remain orthogonal to the gate structure. Id. We do not find Appellants’ arguments persuasive of reversible error. As the Examiner notes, the advantage of the claimed shape urged by Appellants is not directed to the claimed shape per se, but to how the claimed shape may be made. However, as acknowledged by Appellants, the claims are not directed to the method of making the semiconductor device, nor are they directed to a product by process. Id. at 14. Appellants do not provide any evidence that the semiconductor device comprising a gate structure with the claimed shape of the end face performs any function or 6 Appeal 2016-005013 Application 13/486,185 has any purpose different from Becker’s semiconductor device having Becker’s disclosed gate structure with an orthogonal end face shape. See In re Gal, 980 F.2d 717, 719 (Fed. Cir. 1992) (finding of “obvious design choice” precluded where the claimed structure and the function it performs are different from the prior art). Nor have Appellants provided any evidence that the claimed shape produces an unexpected result. In re Rice, 341 F.2d 309, 314 (CCPA 1965) (“Appellants have failed to show that the change [in the claimed invention] as compared to [the reference], result[s] in a difference in function or give unexpected results.”). In addition, as the Examiner finds (Ans. 4), other shapes, including Becker’s, may be made in a single photolithography and etching process using a correctly designed mask. Conversely, there is no requirement or limitation in the claims that the claimed shape is formed in a single photolithography and etching process—the claims are not product-by process claims. Indeed, the Specification merely teaches that the gate structures may be sectioned non-orthogonally using a single photolithography and/or etching process, not that the non-orthogonal cut must be formed this way. Spec. 120. Accordingly, we discern no error in the Examiner’s finding that “the claimed shape is not uniquely associated with the alleged process advantage.” Ans. 4. Turning to the Examiner’s evidence in support of the finding that the claimed shape was a known alternative shape, the Examiner notes that Ema was relied on merely to support the stated position and not for further modifying Becker. Ans. 7. “It is well established that a determination of obviousness based on teachings from multiple references does not require an actual, physical substitution of elements.” In re Mouttet, 686 F.3d 1322, 7 Appeal 2016-005013 Application 13/486,185 1332 (Fed. Cir. 2012) (citing In re Etter, 756 F.2d 852, 859 (Fed. Cir. 1985) (en banc)); see also In re Keller, 642 F.2d 413, 425 (CCPA 1981) (“To justify combining reference teachings in support of a rejection it is not necessary that a device shown in one reference can be physically inserted into the device shown in the other.”). “Rather, the test is what the combined teachings of the references would have suggested to those of ordinary skill in the art.” Keller, 642 F.2d at 425. Ema teaches an embodiment wherein the gate structures have a substantially parallelogram planar surface shape such that the short ends (end faces) of the gate structures 15 run parallel to the long-side edges of the isolation regions 2. Ema 6:23—28. However, Appellants do not direct our attention to any teaching in Ema that provides that the end faces of the gate structures 15 at any particular angle relative to the isolation regions has any purpose or performs any function, nor do we find any. Ema merely requires that the area of each gate structure 15 overlying regions 3 (which is unrelated to the end face shape of the gate structure 15) does not change due to positional error. Id. at 6:29-35. Indeed, Ema is silent, as is the entire record in this case, that the end face shape of the gate structure has any effect on function or performance. Thus, Ema evidences that the shape of the end face of the gate structures is neither critical nor has any function other than as a feature of design choice. Accordingly, we are persuaded that the ordinary artisan would have recognized that the shape of the end faces of the gate structures in Becker may be altered as an obvious design choice to provide the claimed shape. Cf. Kuhle, 526 F.2d 553, 555 (CCPA 1975) (finding that the use of the claimed feature “would be an obvious matter of design choice” when it 8 Appeal 2016-005013 Application 13/486,185 “solves no stated problem” and “presents no novel or unexpected result” over the disclosed alternatives). In this context, a non-orthogonal end face of the gate structure has the same functionality and purpose as an orthogonal end face, and “cannot be used as a distinguishing factor to render the claims nonobvious.” In re Magna Electronics, Inc., 611 F. App’x 969, 974 (Fed. Cir. 2015). In reaching this conclusion, we are mindful of the guidance provided in Ex parte Gunasekar, 2011 WL 3872007, at *5 (BPAI Aug. 29, 2011): When determining whether a rejection based on design choice is appropriate, the Examiner must review the Specification and ascertain if the limitation in question is disclosed as serving any advantage or particular purpose, or whether it solves a stated problem. The Examiner also should explain the reasoning used to determine that the prior art would have performed equally as well as the claimed invention. These two steps help present the aforementioned “convincing line of reasoning.” Ex parte Clapp, 227 USPQ [972,] 973 [(BPAI 1985)]. Here, the Examiner and we have reviewed the record, including the Specification, to ascertain if the limitation in question is disclosed as serving any advantage or particular purpose, or whether it solves a stated problem. Like the Examiner, we find no evidence that the claimed shape of the end faces of the gate structures serve any advantage or particular purpose or solve any stated problem. Moreover, as the gate structure is otherwise unaltered, there is no reason in this record that the ordinary artisan would expect any performance difference between semiconductor devices having orthogonal and non-orthogonal end faces. 9 Appeal 2016-005013 Application 13/486,185 Accordingly, we are not persuaded that the Examiner reversibly erred in rejecting claim 1 over the proposed combination of Becker and Houston, as evidenced by Ema. DECISION Upon consideration of the record, and for the reasons given above and in the Final Office Action and the Answer, the decision of the Examiner rejecting claims 1—9, 11, 12, 14, and 21—25 under 35 U.S.C. § 103(a) as unpatentable over Becker in view of Houston and Ema, alone or further in view of Ngo, is affirmed. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(1). AFFIRMED 10 Appeal 2016-005013 Application 13/486,185 NAGUMO, Administrative Patent Judge, dissenting. I dissent, with respect. The key limitation for purposes of resolving this appeal is the requirement that there be a “gate structure segment having an end with a face defined by linear edges, wherein a plane extending from the face is non- orthogonal to a sidewall of the first gate structure.” (App. Br. 19, claim 1.) Becker describes a cross-coupled transistor configuration.s as a distinct alternative to cross-coupled inverters used for Static Random Access Memory (SRAM) bit cell circuits. (Becker, [0053]—[0062].) Figure 16C, shown on the following page with added annotations, illustrates the features relevant in this appeal. Gate 401A of a first transistor is connected via conductive traces, including link 1621, to gate 407A of a fourth transistor. 11 Appeal 2016-005013 Application 13/486,185 {Becker Figure 16C is shown below} {Becker Fig. 16 shows a cross-coupled transistor circuit} As the Examiner recognized in the Final Rejection, gate 401A does not have a face non-orthogonal to its sidewalls. The Examiner took official notice that various shaped faces were known in such circumstances, and, when challenged, cited Ema as evidence supporting the notice. (Advisory Action entered 24 April 2015). 12 Appeal 2016-005013 Application 13/486,185 Ema teaches, in Figure 9, shown below, }7 {Figure 9 shows floating electrodes 15 in a nonvolatile memory device} a nonvolatile semiconductor memory device that comprises floating gate 15, which is a parallelogram. Assuming floating gate 15 has a face and sidewalls, the face is non-orthogonal to the sidewalls.10 The difficulty with this analysis, as Appellants point out (App. Br. 15— 16), is that floating electrode 15 not the same as any structure in Becker. In my view, the Examiner has not explained why the floating gate of Ema corresponds sufficiently to gate 401A or to any other structure of Becker, that the routineer would have considered using a non-orthogonal face on any gate in Becker. Accordingly, I would reverse the appealed rejections, and I dissent, respectfully, from the Decision to Affirm. 10 Ema explains that if a charge is stored on floating gate 15, the circuit can recognize that no information is stored in selected EPROM cell T; but if no charge is stored on floating gate 15, the circuit can recognize that information has been stored in that EPROM cell. (Ema, col. 5,11. 1—15.) 13 Copy with citationCopy as parenthetical citation