Ex Parte Lin et alDownload PDFPatent Trial and Appeal BoardJun 3, 201611677320 (P.T.A.B. Jun. 3, 2016) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE 111677,320 02/21/2007 42717 7590 06/07/2016 HA YNES AND BOONE, LLP IP Section 2323 Victory A venue Suite 700 Dallas, TX 75219 FIRST NAMED INVENTOR Chien-Hsun Lin UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. 2006-0403 I 24061.796 9736 EXAMINER RIDDLE, CHRISTINA A ART UNIT PAPER NUMBER 2882 NOTIFICATION DATE DELIVERY MODE 06/07/2016 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address( es): ipdocketing@haynesboone.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte CHIEN-HSUN LIN, AN-KAO YANG, JUI-CHUNG PENG, and YAO-WEN GUO Appeal2014-006520 Application 11/677,320 Technology Center 2800 Before GEORGE C. BEST, CHRISTOPHER C. KENNEDY, and BRIAND. RANGE, Administrative Patent Judges. BEST, Administrative Patent Judge. DECISION ON APPEAL The Examiner finally rejected claims 1-6, 8-18, and 20-24 of Application 11/677,320 under 35 U.S.C. § 103(a) as obvious. Final Act. (August 13, 2013). Appellants 1 seek reversal of these rejections pursuant to 35 U.S.C. § 134(a). We have jurisdiction under 35 U.S.C. § 6(b). For the reasons set forth below, we REVERSE. 1 Taiwan Semiconductor Manufacturing Co., Ltd. is identified as the real party in interest. Appeal Br. 3. Appeal2014-006520 Application 11/677,320 BACKGROUND The '320 Application describes improved methods and apparatus for manufacturing a microelectronic apparatus by lithography. Spec. iii! 1-3. Claims 1 and 13 are representative of the '320 Application's claims and are reproduced below: 1. A method of manufacturing a microelectronic apparatus, compnsmg: exposing a pattern in a dummy field on a substrate by utilizing a lithographic scanner at a first speed; and exposing the same pattern in a production field on the substrate by utilizing the lithographic scanner at a second speed; wherein the first speed is substantially greater than the second speed, and wherein the dummy field comprises an exposure area that overlaps an outermost edge of the substrate, and further wherein the production field comprises an exposure area that lies completely within the outermost edge of the substrate, further wherein the pattern extends to the outermost edge of the substrate. Appeal Br. 12 (Claims App.) (some paragraphing added). 13. An apparatus, comprising: means for exposing a pattern in a dummy field on a substrate at a first speed; and means for exposing the same pattern in a production field on the substrate at a second speed, wherein the first speed is substantially greater than the second speed, and wherein the dummy field comprises an exposure area that overlaps an outermost edge of the substrate, and 2 Appeal2014-006520 Application 11/677,320 further wherein the production field comprises an exposure area that lies completely within the outermost edge of the substrate, further wherein the pattern extends to the outermost edge of the substrate. Appeal Br. 13 (some paragraphing added). REJECTIONS On appeal, the Examiner maintains the following rejections: 1. Claims 1, 3-6, 13, and 15-18 are rejected under 35 U.S.C. § 103(a) as unpatentable over the combination of Koike2 and Glent- Madsen. 3 Final Act. 2. 2. Claims 2 and 14 are rejected under 35 U.S.C. § 103(a) as unpatentable over the combination of Koike, Glent-Madsen, and Kumar. Final Act. 7. 3. Claims 8-12 and 20-24 are rejected under 35 U.S.C. § 103(a) as unpatentable over the combination of Kurosawa, Koike, and Glent- Madsen. Final Act. 8. DISCUSSION Rejections 1 and 2. Appellants present substantive argument for reversal of the rejection of independent claim 1. Appeal Br. 8-9. Appellants argue that the rejections of claims 2-6 and 13-18 should be 2 JP 406020903, published January 28, 1994. We cite a machine translation entered into the record of the '320 Application on August 13, 2013. 3 WO 2004/021269 Al, published March 11, 2004. 3 Appeal2014-006520 Application 11/677,320 reversed for the same reason that the rejection of claim 1 should be reversed. See id. at 9-10. Accordingly, we limit our analysis to claim 1. In rejecting claim 1, the Examiner found that Koike describes almost every limitation recited in claim 1. Final Act. 2-3. The Examiner, however, found that Koike does not appear to explicitly describe the requirement that the first speed be substantially greater than the second speed. Id. at 3. The Examiner further found that Glent-Madsen discloses exposure with different speeds where the first speed is substantially greater than the second speed (page 14, line 30-page 15, lines [sic] 5, exposure is performed with different scanning speeds, including accelerating at the edge of the light-sensitive substrate, thereby allowing a higher speed at the edge of the substrate then towards the center). Id. The Examiner also found: It would have been obvious to one of ordinary skill in the art at the time of the invention to have included exposing with a first speed substantially greater than the second speed as taught by Glent-Madsen with the exposure method of exposing a same pattern in a dummy field and a production field as taught by Koike since, as shown by Glent-Madsen, having a first speed substantially greater than the second speed is commonly used in order to improve the flexibility of the lithography system since other changes, such as in intensity and quality, can be made by easily changing the scanning speed and allowing scanning at different speeds improves the efficiency of the lithography system (see page 14, line 30-page[ ]15, line 5). Id. at 3-4. Based upon these findings of fact, the Examiner concluded that the differences between the prior art in subject matter of claim 1 would have been obvious to a person of ordinary skill in the art at the time of the invention. 4 Appeal2014-006520 Application 11/677,320 Appellants argue that the rejection of claim 1 should be reversed because the Examiner did not establish a prima facie case of obviousness. Appeal Br. 8-9. In particular, Appellants argue that the Examiner erred by finding that the combination of Koike and Glent-Madsen describes or suggests using "different speeds for the desired pattern and the dummy shot as recited in claim l ." Id. at 9. We agree with Appellants and determine that the Examiner erred in finding that Glent-Madsen describes or suggests increasing the scanning speed of the lithographic apparatus during the exposure of a dummy shot. The portion of Glent-Madsen cited by the Examiner reads: Thereby it is possible to highly improve the efficiency, as exposure may be carried out at different scanning speeds, e.g. when slowing down or accelerating at the edges of the light sensitive surface. Furthermore the possibility of changing the scanning speed, whether continuously or stepwise, highly improves the flexibility of the system, as changes in the intensity of the light source, the sensitivity or other properties of the light sensitive surface, the desired quality, or several other parameters may be more or less easily met by a change in the scanning speed. Glent-Madsen 14-15 (emphasis added). As can be seen, Glent-Madsen suggests varying the scanning speed by slowing down or accelerating at the edges of the light-sensitive surface, which corresponds with at least some of the time during which a dummy shot is being taken. Glent-Madsen, however, does not suggest the direction in which the scanning speed should be varied and does not suggest increased speed while taking a dummy shot. Moreover, the Examiner does not provide any factual finding or explanation as to why a person having ordinary skill in the art at the time of the invention would have chosen to increase the scanning speed while 5 Appeal2014-006520 Application 11/677,320 exposing a pattern in a dummy field relative to the speed of exposing the same pattern in a production field. Because "rejections on obviousness grounds cannot be sustained by mere conclusory statements[,] ... there must be some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness." In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006). For the reasons set forth above, we reverse the Examiner's rejection of claim 1. Thus, we also reverse the rejection of claims 2-6 and 13-18. Rejection 3. The Examiner rejected claims 8-12 and 20-24 as unpatentable over the combination ofKoike, Glent-Madsen, and Kurosawa. Final Act. 8. Independent claims 8 and 20 contain limitations similar to those recited in claim 1. Appellants further argue that "the arguments given above in favor of the patentability of claim 8, apply to claim 20 as well." Appeal Br. 11. Accordingly, we limit our discussion to the rejection of claim 8. Claims 9-12 and 20-24 will stand or fall with claim 8. Appellants argue that the rejection of claim 8 should be reversed because Kurosawa does not remedy the deficiencies of the combination of Koike and Glent-Madsen. Id. at 10-11. Because the Examiner relies upon Kurosawa as describing the use of a third scanning speed, the Final Action does not contain findings regarding the use of a higher scanning speed when a dummy shot is being exposed than when a production shot is being exposed. Thus, we agree with Appellants and reverse the rejection of claim 8. We, therefore, also reverse the rejection of claims 9-12 and 20-24. 6 Appeal2014-006520 Application 11/677,320 CONCLUSION For the reasons set forth above, we reverse the rejections of claims 1- 6, 8-18, and 20-24. REVERSED 7 Copy with citationCopy as parenthetical citation