Ex Parte LAN et alDownload PDFPatent Trial and Appeal BoardFeb 26, 201915073372 (P.T.A.B. Feb. 26, 2019) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. FILING DATE 15/073,372 03/17/2016 64728 7590 02/28/2019 SHUMAKER, LOOP & KENDRICK, LLP NORTHROP GRUMMAN CORPORATION 42690 WOODWARD A VENUE SUITE 300 BLOOMFIELD HILLS, MI 48304 FIRST NAMED INVENTOR XINGLAN UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. NGC-00206(007655-0030) 1290 EXAMINER CLEVELAND, MICHAEL B ART UNIT PAPER NUMBER 1712 NOTIFICATION DATE DELIVERY MODE 02/28/2019 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): CCARDINALE@SLK-LA W.COM tlopez@slk-law.com c golupski@ slk-law. com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte XING LAN and CHUNBO ZHANG Appeal2018-002269 Application 15/073,372 Technology Center 1700 Before MICHAEL P. COLAIANNI, GEORGE C. BEST, and N. WHITNEY WILSON, Administrative Patent Judges. BEST, Administrative Patent Judge. DECISION ON APPEAL The Examiner rejected claims 1-20 of Application 15/073,372 under 35 U.S.C. § 103 as obvious. Final Act. (June 29, 2017). Pursuant to 35 U.S.C. § 134(a), Appellant1 seeks reversal of these rejections. We have jurisdiction under 35 U.S.C. § 6(b). For the reasons set forth below, we reverse. 1 Northrop Grumman Systems Corp. is identified as the applicant and real party in interest. Appeal Br. 4. Appeal2018-002269 Application 15/073,372 BACKGROUND The '372 Application describes a micro-electromechanical system (MEMS) switch that is fabricated on a substrate using ink printing technologies. Spec ,r 1. Claim 1 is representative of the '372 Application's claims and is reproduced below from the Claims Appendix: 1. A method for fabricating a micro-electromechanical system (MEMS) switch, said method comprising: providing a substrate; printing at least one bias electrode, at least one connection pad and at least one contact pad on the substrate; printing a sacrificial layer on the substrate and over the at least one bias electrode and at least part of the contact pad; printing a flexible beam structure on the sacrificial layer; and removing the sacrificial layer to release the beam structure so that the beam structure is spaced some distance from the at least one bias electrode and the contact pad. Appeal Br. 21 (Claims App.) 2 Appeal2018-002269 Application 15/073,372 REJECTIONS On appeal, the Examiner maintains the following rejections: 1. Claims 1, 7, and 8 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park2 and Melman. 3 Final Act. 3. 2. Claims 4 and 5 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, and Weaver. 4 Final Act. 5. 3. Claim 6 is rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, and Zettl. 5 Final Act. 6. 4. Claim 20 is rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Weaver, and Zettl. Final Act. 7. 5. Claims 2 and 3 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Liu, 6 and Tai. 7 Final Act. 8. 2 E. S. Park, Application of Inkjet-Printing Technology to Micro-Electro- Mechanical Systems, University of California at Berkeley, Technical Report No. UCB/EECS-2014-44 (2014), http://www2.eecs.berkeley.edu/Pubs/TechRpts/20l4/EECS-2014-44.pdf (hereinafter "Park"). 3 US 2010/0295079 Al, published Nov. 25, 2010. 4 US 2002/0195674 Al, published Dec. 26, 2002. 5 US 2009/0291270 Al, published Nov. 26, 2009. 6 US 2007/0236307 Al, published Oct. 11, 2007. 7 US 6,094,116, issued July 25, 2000. 3 Appeal2018-002269 Application 15/073,372 6. Claims 9--11 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, and Liu. Final Act. 9. 7. Claims 16 and 19 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Liu, Tai, and Zettl. Final Act. 13. 8. Claims 11 and 13 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Liu, and Nelson. 8 Final Act. 13. 9. Claims 11 and 12 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Wan, 9 and Tai. Final Act. 15. 10. Claims 14 and 15 are rejected under 35 U.S.C. § 103 as unpatentable over the combination Park, Melman, and Ebel. 10 Final Act. 17. 11. Claims 16-18 are rejected under 35 U.S.C. § 103 as unpatentable over the combination of Park, Melman, Zettl, Liu, Tai, and Nelson. Final Act. 18. DISCUSSION Appellant argues for the reversal of the obviousness rejections to claims 1-20 on the basis of limitations present in independent claims 1, 16, and 20. See Appeal Br. 4--19; see also Reply Br. 1---6. We select claim 1 as 8 US 6,646,215 Bl, issued Nov. 11, 2003. 9 US 2005/0146241 Al, published July 7, 2005. 10 US 2007/0044289 Al, published Mar. 1, 2007. 4 Appeal2018-002269 Application 15/073,372 representative. Claims 2-15 and 17-19 will stand or fall with each of their respective independent claims. 37 C.F.R. § 4I.37(c)(l)(iv). Rejection 1. Two or more references can be combined to form the basis for an obviousness rejection only if they are analogous art to the claimed invention. The Federal Circuit has explained that [ t ]wo separate tests define the scope of analogous prior art: (1) whether the art is from the same field of endeavor, regardless of the problem addressed and, (2) if the reference is not within the field of the inventor's endeavor, whether the reference still is reasonably pertinent to the particular problem with which the inventor is involved. In re Bigio, 381 F.3d 1320, 1325 (Fed. Cir. 2004) (internal citation omitted). The scope of analogous art is to be construed broadly. Wyers v. Master Lock Co., 616 F.3d 1231, 1238 (Fed. Cir. 2010) ("The Supreme Court's decision in KSR International Co. v. Teleflex, Inc . ... directs us to construe the scope of analogous art broadly"). Here, Appellant argues, inter alia, that "the Melman white light emitting device 100 is not analogous to a MEMS switch." Appeal Br. 12 ( emphasis added). First, as Appellant argues (Reply Br. 2), Melman is not in Appellant's field of endeavor. The '372 Application's Specification and claims are directed to fabricating an MEMS switch. Melman, on the other hand, describes a method for fabricating a white light emitting device. Melman Abstract, ,r 48. The Examiner does not point to any evidence in the record that would support a finding that MEMS switch fabrication and white light emitting device manufacturing are in the same field of endeavor. Rather, the Examiner argues that "both LED and MEMS are electronic devices and/ or 5 Appeal2018-002269 Application 15/073,372 fall under the broader electronic device category." Answer 3. Under the Examiner's reasoning, however, all electronic devices would be considered analogous art which we determine would be an overly broad interpretation of the "fied of endeavor". Therefore, on this record, we conclude that Melman is not in Appellant's field of endeavor. Second, Appellant argues that Melman is non-analogous art "because providing the sacrificial layer 148 to protect the passivation layer 138 when fabricating the white light emitting device 100 in Melman is not reasonably pertinent to the problem of providing a suitable sacrificial layer [80] that is dissolved to release a flexible cantilever beam structure [112] in an MEMS switch." Reply Br. 3 (emphasis added); compare Melman Fig. 5a, ,r 56 with Spec. Figs. 7, 8, ,r,r 19, 23. In response to this contention, the Examiner found that Melman "is still a proper analogous art as it is concerned with a pertinent problem of interest to the instant invention ... , namely being the problem of how to apply a polymer-based sacrificial layer." Answer 3. The Examiner made this finding based upon consideration of the function of Melman's sacrificial layer. Id. (Melman "protect[s] a corresponding underlying portion from an above-the-mask treatment."). Melman may only be used in an obviousness rejection if it is reasonably pertinent to the particular problem which the inventor was addressing. Bigio, 381 F.3d at 1325. On this record, we cannot say that the Examiner has properly supported such a finding. As Appellant argues (Reply Br. 5), Melman's concern with the general problem of applying a polymer-based sacrificial layer to protect an underlying portion is not reasonably pertinent to Appellant's particular problem of depositing a 6 Appeal2018-002269 Application 15/073,372 sacrificial layer that is compatible with an overlying conductive polymer flexible beam. The Examiner has not provided an adequate explanation of why, in the absence of Appellant's disclosure, a person of ordinary skill in the art of fabricating a MEMS switch would look to methods for fabricating a white light emitting device. The Examiner's finding that Melman is analogous art because it is reasonably pertinent to the problem confronting Appellant is not supported by the record in this appeal. Because the Examiner erred by finding that Melman is analogous art to the claimed invention, we reverse the rejection of claims 1, 7, and 8 as unpatentable over the combination of Park and Melman. Rejection 2-Rejection 11. As discussed above, we have determined that the Examiner erred by finding that Melman is analogous art and available for use in a § 103 rejection. We, therefore, reverse the rejections of claims 2---6 and 9-20 as unpatentable over the combination of Park and Melman, either with or without Weaver, Zettl, Liu, Tai, Nelson, Wan, and Ebel. CONCLUSION For the reasons set forth above, we reverse the§ 103 rejections of claims 1-20 of the '372 Application. REVERSED 7 Copy with citationCopy as parenthetical citation