Ex Parte Houge et alDownload PDFBoard of Patent Appeals and InterferencesNov 23, 201010505197 (B.P.A.I. Nov. 23, 2010) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES ____________ Ex parte ERIK C. HOUGE, JOHN M. MCINTOSH, and ROBERT FRANCIS JONES ____________ Appeal 2009-003795 Application 10/505,197 Technology Center 1700 ____________ Before CHUNG K. PAK, PETER F. KRATZ, and MARK NAGUMO, Administrative Patent Judges. Opinion for the Board filed by KRATZ, Administrative Patent Judge. Opinion Concurring filed by NAGUMO, Administrative Patent Judge. DECISION ON APPEAL1 1 The two-month time period for filing an appeal or commencing a civil action, as recited in 37 C.F.R. § 1.304, or for filing a request for rehearing, as recited in 37 C.F.R. § 41.52, begins to run from the “MAIL DATE” (paper delivery mode) or the “NOTIFICATION DATE” (electronic delivery mode) shown on the PTOL-90A cover letter attached to this decision. Appeal 2009-003795 Application 10/505,197 2 This is a decision on an appeal under 35 U.S.C. § 134 from the Examiner’s final rejection of claims 1-21. We have jurisdiction pursuant to 35 U.S.C. § 6. Appellants’ claimed invention is directed to a method and system for monitoring and controlling a fabrication process on a workpiece using a crystallographic analysis subsystem. In the subsystem, crystallographic orientation, grain size or grain morphology are acquired from the workpiece after the workpiece undergoes a fabrication step and the information is provided to a fabrication subsystem for modifying parameters associated with the fabrication steps. Claims 1 and 11, the sole independent claims on appeal, are illustrative and reproduced below: 1. A system for monitoring and controlling a fabrication process comprising: a plurality of fabrication subsystems that perform respective fabrication steps on a workpiece; and a crystallographic analysis subsystem for acquiring crystallographic orientation, grain size, or grain morphology from the workpiece after the workpiece undergoes a fabrication step by at least a first subsystem, the crystallographic analysis subsystem coupled to one or more of the fabrication subsystems to provide information for modifying parameters associated with the respective fabrication steps. 11. A method for monitoring and controlling a fabrication process comprising: coupling a plurality of fabrication subsystems that perform respective fabrication steps on a workpiece; Appeal 2009-003795 Application 10/505,197 3 acquiring crystallographic orientation, grain size, or grain morphology from the workpiece after the workpiece undergoes a fabrication step by at least a first subsystem; and providing information to one or more of the fabrication subsystems for modifying parameters associated with the respective fabrication steps. The Examiner relies on the following prior art references as evidence in rejecting the appealed claims: Manada 5,463,977 Nov. 7, 1995 Adams 5,466,934 Nov. 14, 1995 The Examiner maintains the following rejections, which are before us on appeal: Claims 1, 2, 6-8, 11-13, 17, and 18 stand rejected under 35 U.S.C. § 103(a) as being unpatentable over Manada in view of Adams. The Examiner further rejects dependent claims 3-5, 9, 10, 14-16, and 19-21 over the same combination of references. We reverse. ISSUE Did the Examiner err in asserting that the combined teachings of Manada and Adams would have rendered obvious a modification to Manada’s light reflection analysis system that would have resulted in employing the crystal property measuring techniques taught in column 2 and the figures of Adams in Manada in a manner so as to measure more than thickness and consequently result in a system or method as required by independent claims 1 and/or 11 within the meaning of § 103? We answer this question in the affirmative. Appeal 2009-003795 Application 10/505,197 4 PRINCIPLE OF LAW "[T]he Examiner bears the initial burden, on review of the prior art or on any other ground, of presenting a prima facie case of unpatentability." In re Oetiker, 977 F.2d 1443, 1445 (Fed. Cir. 1992). FACTUAL FINDINGS Manada discloses a method an apparatus for epitaxial growing chemical compound crystal in a closed container from introduced raw material gases in a manner to secure uniformity in a plane of a crystal film of the crystal which is applicable to a wide range of pressures (abstract; col. 1, ll. 59-67). Manada discloses that reflected light from an incident light source can be measured and the results used to control the amounts of raw material gases charged and the growing rate of the crystal film on the basis of reflected light intensity changes (abstract; col. 2, l. 1- col. 3, l. 5). Manada teaches that a mutual relationship between the film thickness that is grown per cycle and a changing rate of reflected light intensity can be utilized in controlling the growing rate of a growing film and the thickness thereof (col. 5, ll. 7-32; Figs. 1-3). Adams is drawn to a method and apparatus for identifying crystallographic defects in a polycrystalline material sample. Adams uses a scanning electron microscope that bombards numerous points of the sample with an electron beam and wherein backscatter diffraction patterns are collected with an image collection system (abstract; col. 1, ll. 7-11). If backscatter diffraction images collected for first and second points are determined to exceed a predetermined level, coordinates of the second point Appeal 2009-003795 Application 10/505,197 5 are said to identify a crystallographic defect (Adams; col. 2, ll. 24-36). In column two of Adams, a brief description of Adams’ drawing figures is further provided. The Examiner states that “[t]he sole difference between the instant claims and the prior art is the plurality of subsystems” (Ans. 3). Thereafter, the Examiner states that: The Manada et al reference further differs from the instant claims in the measurements. However, the Adams et al reference teaches measuring crystal properties, note figures and col. 2. It would have been obvious to one of ordinary skill in the art to modify the Manada et al by the teachings of the Adams to measure more then [sic] thickness in order to create a more uniform crystal. Ans. 3. The Examiner does not point out where Adams teaches or suggests that measuring more than thickness, in particular acquiring crystallographic orientation, grain size, or grain morphology of a growing crystal film by using Adams’ technique of identifying crystallographic defects in a polycrystalline material sample using a scanning electron microscope that bombards numerous points of the sample with an electron beam and wherein backscatter diffraction patterns are collected with an image collection system, would be applicable in forming a uniform crystal during the controlled epitaxial growing of a chemical compound crystal; such as, in accordance with a method or system as disclosed by Manada (see generally Answer). Appeal 2009-003795 Application 10/505,197 6 ANALYSIS/CONCLUSION The record before us contains no articulated reasoning with some rational underpinning as to how and why one with ordinary skill in the art would have provided a system or method modification to acquire crystallographic orientation, grain size, or grain morphology as an addition to the system and method of Manada wherein incident light is employed and refracted light is measured and the results used to control the amounts of raw material gases charged and the growing rate of the crystal film on the basis of reflected light intensity changes based on the disparate polycrystalline sample defect identification system and method of Adams. On this record, the Examiner’s proposed modification of adding the polycrystalline material sample crystallographic defects identification apparatus and/or method of Adams to Manada, as discussed above, has not even been shown to be compatible with Manada’s epitaxial chemical compound crystal growing method and system. The Examiner has not persuasively articulated that Adams’ defect identification system is capable of use in performing the function of securing uniformity in a plane of a crystal film of the crystal which is applicable to a wide range of pressures as Manada’s method and system of controlled chemical compound crystal growth is directed to. As Appellants argue (App. Br. 9), a proposed modification that is not satisfactory for or incompatible with the intended crystal growing function of Manada evinces a lack of suggestion therefore. See also In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006) ("[R]ejections on obviousness grounds cannot be sustained by mere conclusory statements; instead, there must be Appeal 2009-003795 Application 10/505,197 7 some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness"), cited with approval in KSR Int'l Co. v. Teleflex Inc., 550 U.S. 398, 417-18 (2007). The Examiner has furnished no reason that affords a contrary conclusion with respect to the separately addressed dependent claims. It follows that we do not sustain the Examiner's § 103 rejections, on this record. ORDER The Examiner’s decision to reject claims 1-21 under 35 U.S.C. § 103(a) as being unpatentable over Manada in view of Adams in separately stated rejections is reversed. REVERSED Appeal 2009-003795 Application 10/505,197 1 NAGUMO, Administrative Patent Judge, concurring I agree with the disposition of this appeal, but I would REVERSE the Examiner’s rejections for the reasons well-stated by the Appellants in the Brief at pages 6 through 9. Manada expressly uses an optical monitoring system to avoid high energy electron diffraction methods that are said to give rise to defects in growing epitaxial crystal films. Adams teaches using an electron back scatter diffraction pattern technique—the very sort of technique Manada seeks to avoid (Br. 9, 1st para.)—to acquire information about the growing crystal films. This incompatibility suffices to demonstrate reversible error in the Examiner’s rejection. (It is also debatable whether Adams actually obtains information about crystallographic orientation, grain size, or grain morphology, since only differences in signal are necessary, but that is a distinct issue, not fully explored during prosecution, that we need not address.) Although the claimed method and “system” for monitoring and controlling a fabrication process in which crystallographic parameters are important would seem to apply to a vast array of processes, including gem-cutting, references selected to show the obviousness of the claimed steps must be compatible with one another. As Appellants point out, the Examiner has failed to select compatible references. sld HITT GAINES, PC LSI Corporation PO BOX 832570 RICHARDSON TX 75083 Copy with citationCopy as parenthetical citation