Ex Parte Fischer et alDownload PDFBoard of Patent Appeals and InterferencesApr 26, 201010445146 (B.P.A.I. Apr. 26, 2010) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES ____________________ Ex parte ANDREAS FISCHER, WILLIAM S. KENNEDY, PETER LOEWENHARDT, and DAVID TRUSSELL ____________________ Appeal 2009-013927 Application 10/445,146 Technology Center 1700 ____________________ Decided: April 26, 2010 ____________________ Before MICHAEL P. COLAIANNI, CATHERINE Q. TIMM, and JEFFREY T. SMITH, Administrative Patent Judges. TIMM, Administrative Patent Judge. DECISION ON APPEAL I. STATEMENT OF CASE Appellants appeal under 35 U.S.C. § 134 from the Examiner’s decision to reject claims 1-7, 10, 21, 23-25, and 35-38. We have jurisdiction under 35 U.S.C. § 6(b). We REVERSE. Appeal 2009-013927 Application 10/445,146 2 Appellants’ invention relates to a multi-part upper electrode for a semiconductor plasma reactor in which a central portion of the electrode is independently replaceable from an outer peripheral portion of the electrode (Spec. ¶ [0022]). Claim 1 is illustrative: 1. A multi-part electrode for a plasma reaction chamber comprising: an electrode top plate; and an electrode connected to the top plate, the electrode including a central silicon element and a plurality of silicon segments surrounding the central silicon element, the silicon segments forming a step on a lower surface of the electrode, wherein the central silicon element is removable from the top plate independent of the silicon segments; and sealing ring to prevent gas flow in an annulus between the central silicon electrode and the silicon segments; wherein the central silicon element has a maximum thickness which is less than a maximum thickness of the silicon segments. The Examiner relies upon the following evidence: First Named Inventor Document No. Issue or Pub. Date Lenz Foster Strang US 5,569,356 US 6,220,202 B1 US 6,806,653 B2 Oct. 29, 1996 Apr. 24, 2001 Oct. 19, 2004 Lilleland Fischer Urano1 US 2001/0031557 A1 US 2004/0074609 A1 JP 10-289881 A Oct. 18, 2001 Apr. 22, 2004 Oct. 27, 1998 1 We refer to the English language Abstract and the computer-prepared English language translation of Urano made of record in an Office Communication mailed June 20, 2006. Appeal 2009-013927 Application 10/445,146 3 The Examiner maintains, and Appellants seek review of, the following rejections: 1. The rejection of claims 1, 2, 5-7, 10, 21, 23-25, 35, and 36 under 35 U.S.C. § 103(a) as unpatentable over admitted prior art in view of Urano, Strang, and Lenz; 2. The rejection of claims 3 and 4 under 35 U.S.C. § 103(a) as unpatentable over admitted prior art in view of Urano, Strang, Lenz, and Lilleland; 3. The rejection of claims 37 and 382 under 35 U.S.C. § 103(a) as unpatentable over admitted prior art in view of Urano, Strang, Lenz, and Foster. II. DISPOSITIVE ISSUE The issue raised by the contentions of Appellants and the Examiner is: Did the Examiner provide a sufficient reason why one of ordinary skill in the art would have modified electrode 10 of admitted prior art Figure 1 to obtain the central silicon element and surrounding silicon segments required by claim 1 based on the teachings of Urano? We answer this question in the negative. III. FINDINGS OF FACT 1. The admitted prior art Figure 1 includes an upper electrode 10 with a step 14 ground into the electrode “to provide etch rate uniformity at the edge of the chip” and a separate extension electrode 16 which is 2 The Examiner’s rejection is stated as the rejection of claims 36 and 37 (Ans. 3 and 12). However, as pointed out by Appellants, it appears that the Examiner intended to reject claims 37 and 38 (Br. 17-18; Reply Br. 7). We consider this misstatement harmless error. Appeal 2009-013927 Application 10/445,146 4 constructed of a plurality of silicon electrode segments (Spec. ¶¶ [0011]- [0012]; Figure 1). 2. Urano teaches an assembly which has a central electrode portion 24 and a peripheral edge portion 25, at least one of which are vertically movable (Urano, English Language Abstract). 3. Figure 1 of Urano shows the central electrode portion 24 having a thickness less than the peripheral edge portion 25 (Urano, Figure 1). 4. Urano teaches that the independently adjusted electrodes provide an expanded field where the plasma is uniform (Urano, ¶ [0020]). IV. PRINCIPLES OF LAW Rejections based on § 103(a) must rest on a factual basis with these facts being interpreted without hindsight reconstruction of the invention from the prior art. In re Warner, 379 F.2d 1011, 1017 (CCPA 1967). V. ANALYSIS In the Examiner’s rejection of claim 1, the Examiner states that: it would have been obvious to one of ordinary skill in the art at the time of the invention to modify the extension segments 16 [of admitted prior art Figure 1 from Appellants’ Specification] to extend to include the step 14 of the Admitted Prior Art so that the central element has a maximum thickness which is less than a maximum thickness of the segments as taught by Urano since it is obvious to make a top electrode separable and the thickness of the peripheral electrode surface affects the plasma distribution on the surface of the wafer. (Ans. 5.) Appellants contend that the Office has not established that the proposed modifications of the prior art assembly would have been obvious to one of ordinary skill in the art because, among other things, the admitted prior art includes an electrode extension that “is already separated from the Appeal 2009-013927 Application 10/445,146 5 electrode 10” and that “the APA [admitted prior art] electrode assembly already includes a portion to affect the plasma distribution at the peripheral edge of the wafer” (Reply Br. 4 and 5). We agree. The Examiner has not provided a sufficiently reasonable rationale for modifying the admitted prior art. The admitted prior art upper electrode was already separated into a central section 10 and extension segments 16. Thus, one of ordinary skill in the art would not have needed an alternative separation between the electrode portions without a further articulated reason to do so. Likewise, the admitted prior art already included a step 14 to address the uneven distribution of plasma at the edges of a chip. Thus, one of ordinary skill in the art would not have raised or lowered the respective electrode sections of the admitted prior art to address the same problem addressed by step 14. Accordingly, there is a reversible error in the Examiner’s reasoning for combining the teachings of Urano and the admitted prior art. The Examiner applied the teachings of Urano and the admitted prior art in the same way for each of the independent and dependent claims. Accordingly, we cannot sustain any of the Examiner’s rejections. VI. CONCLUSION On the record before us and for the reasons discussed above, we cannot sustain the rejections maintained by the Examiner. VII. DECISION We reverse the Examiner’s decision. REVERSED cam Appeal 2009-013927 Application 10/445,146 6 BURNS, DOANE, SWECKER & MATHIS, L.L.P. P.O. 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