Ex Parte Den Dekker et alDownload PDFPatent Trial and Appeal BoardJul 29, 201311579679 (P.T.A.B. Jul. 29, 2013) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ____________________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ____________________ Ex parte ARNOLDUS DEN DEKKER, JOHANNES FREDERIK DIJKHUIS, NICOLAS JONATHAN PULSFORD, JOZEF THOMAS MARTINUS VAN BEEK, FREDDY ROOZEBOOM, ANTONIUS LUCIEN KEMMEREN, JOHAN HENDRIK KLOOTWIJK, and MAARTEN DIRK-JOHAN NOLLEN ____________________ Appeal 2011-002767 Application 11/579,679 Technology Center 2800 ____________________ Before CARL W. WHITEHEAD, JR., ERIC S. FRAHM, and ANDREW J. DILLON, Administrative Patent Judges. FRAHM, Administrative Patent Judge. DECISION ON APPEAL Appeal 2011-002767 Application 11/579,679 2 STATEMENT OF THE CASE Introduction Appellants appeal under 35 U.S.C. § 134(a) from a final rejection of claims 1-10 and 12. Claims 11 and 14 have been canceled. Claim 13 has been objected to as containing allowable subject matter, and allowable if rewritten to contain all of the features recited in independent claim 1 from which it depends (Final Rej. 10). We have jurisdiction under 35 U.S.C. § 6(b). We affirm. Exemplary Claim An understanding of the invention can be derived from a reading of exemplary claim 1, which is reproduced below with emphases added: 1. An electronic device comprising a network of at least one thin-film capacitor and at least one inductor on a first side of a substrate of a semiconductor material, the substrate having a resistivity sufficiently high to limit electrical losses of the inductor and being provided with an electrically insulating surface layer on its first side; wherein a first and a second lateral pin diode are defined in the substrate, each of the pin diodes having a doped p-region, a doped n- region and an intermediate intrinsic region arranged laterally between the doped p-region and the doped n-region of each pin diode, and of which pin diodes the intrinsic region of the first pin diode having a larger width than that of the second pin diode, and a resistance of the first pin diode is larger than a resistance of the second pin diode; and wherein a crystal lattice of the substrate includes crosstalk-mitigating lattice defects created by irradiation of the substrate, the crosstalk-mitigating lattice defects configured to prevent crosstalk between the first pin diode and the second pin diode. Appeal 2011-002767 Application 11/579,679 3 The Examiner’s Rejections1 The Examiner rejected: (1) claims 1-5 and 10 under 35 U.S.C. § 103(a) as being unpatentable over Heston (U.S. 4,810,980), Babcock (U.S. 2002/0100950 A1), and Adlerstein (U.S. 4,474,623) (Ans. 3-9); (2) claims 6-8 under 35 U.S.C. § 103(a) as being unpatentable over Heston, Babcock, Adlerstein, and Peichl (U.S. 2004/0119130 A1) (Ans. 7- 8); (3) claim 9 under 35 U.S.C. § 103(a) as being unpatentable over Heston, Babcock, Adlerstein, and LaFleur (U.S. 2003/0170950 A1) (Ans. 8- 9); and (4) claim 12 under 35 U.S.C. § 103(a) as being unpatentable over Heston, Babcock, Adlerstein, Park (U.S. 2004/0094815 A1), and Leipold (U.S. 6,348,718 B1) (Ans. 9-10). Appellants’ Contentions Appellants contend that the Examiner erred in rejecting claims 1-10 and 12 for numerous reasons, including: (1) with respect to claims 1-5 and 10, Heston is a GaAs substrate, while Babcock uses a silicon-on-insulator (SOI) substrate (App. Br. 5-8; Reply Br. 4-8);2, 3 1 In the Final Rejection mailed December 21, 2009, claim 14 was rejected under § 112(1) for lack of written description support (Final Rej. 2), and claim 10 was rejected under § 112(2) for indefiniteness (Final Rej. 2-3). These rejections were withdrawn as indicated in the Advisory Action mailed February 17, 2010 (Advisory Action, 2). Accordingly, the rejections under §§ 112(1) and (2) are not before us. 2 Appellants only present arguments on the merits with regard to independent claim 1 and dependent claim 3 (see App. Br. 5-8; Reply Br. 4- Appeal 2011-002767 Application 11/579,679 4 (2) with respect to claims 6-8, Heston is a GaAs substrate, while Peichl polysilicon (App. Br. 8); and (3) with respect to claim 9, LaFleur’s capacitor is made of oxides that will not interact with GaAs and the oxides of Heston (App. Br. 8-9); and (4) with respect to claim 12, Heston and Park’s GaAs substrate and the silicon substrate taught by Leipold are not compatible (App. Br. 9). Appellants also object to the alleged new grounds of rejection applied by the Examiner (Reply Br. 2-4). However, this is petitionable, and not appealable, therefore, is not within our jurisdiction. Issues on Appeal Did the Examiner err in rejecting claims 1-10 and 12 under 35 U.S.C. § 103(a) as unpatentable over the various combinations of references because: GaAs substrate based apparati (i.e., Heston) are not properly combinable with (a) SOI or polysilicon/silicon based apparati (Babcock), and/or (b) capacitors made of oxides (e.g., LaFleur) will not interact properly with GaAs substrates or oxides of GaAs (e.g., Heston)? 8). We, therefore, select claim 1 as representative of the group of claims 1-5 and 10. 37 C.F.R. § 41.37(c)(1)(vii). 3 Although claim 14 is included in the heading or statement of rejection as being rejected under § 103(a) over the combination of Heston, Babcock, and Adlerstein along with claims 1-5 and 10 (Ans. 3), and the body of the rejection (Ans. 6-7) includes claim 14 in the discussion of the merits of the rejection, claim 14 has been canceled and we find this to be harmless error. We consider only claims 1-5 and 10 to stand rejected under § 103(a) over Heston, Babcock, and Adlerstein, and to be before us on appeal. Appeal 2011-002767 Application 11/579,679 5 ANALYSIS We have reviewed the Examiner’s rejections in light of Appellants’ contentions in the Appeal Brief (App. Br. 4-10) and the Reply Brief (Reply Br. 2-9) that the Examiner has erred. We disagree with Appellants’ conclusions. We adopt as our own (1) the findings and reasons set forth by the Examiner in the action from which this appeal is taken (Ans. 3-10), as well as the Advisory Action mailed February 17, 2010, and (2) the reasons set forth by the Examiner in the Examiner’s Answer in response to Appellants’ Appeal Brief (Ans. 10- 18). We highlight and amplify certain teachings and suggestions of the applied references as follows. We agree with the Examiner’s findings and determinations (Ans. 10- 18), including that Park’s paragraph [0004] teaches that GaAs and silicon substrates are alternatives (Ans. 14). Paragraph [0004] of Park discloses the following: Electrostatic [Radio Frequency Microelectro-Mechanical System (RF MEMS] devices also may require additional fabrication steps, particularly RF MEMS devices requiring high quality frequency performance. Such devices are typically fabricated using RF-compatible substrate materials such as GaAs, ceramics, and high resistivity silicon. (Park, ¶ [0004]) (emphases added). Accordingly, Appellants’ contentions that GaAs and silicon substrates are not combinable are not persuasive. Thus, we agree with the Examiner (Ans. 14) that Park’s paragraph [0004] teaches GaAs and Si are alternatives (although Park is not used in the rejection, but is only used to rebut Appellants’ arguments). In view of our finding that GaAs and silicon substrates are Appeal 2011-002767 Application 11/579,679 6 alternatives, we find: (1) With respect to Rejection (1) (claims 1-5 and 10 rejected under § 103(a) over Heston, Babcock, and Adlerstein (Ans. 3-7)), Appellants’ argument that Heston uses a GaAs substrate, while Babcock uses a SOI substrate, and therefore cannot be compatible or combinable (App. Br. 5-8; Reply Br. 4-8) is not persuasive; (2) With respect to Rejection (2) (claims 6-8 rejected under § 103 overHeston, Babcock, Adlerstein, and Peichl (Ans. 7-8)), Appellants’argument (App. Br. 8) that Heston’s GaAs substrate teaches away from Peichl’s poly-silicon substrate, is not persuasive. (3) With respect to Rejection (3) (claim 9 rejected under § 103 over Heston, Babcock, Adlerstein, and LaFleur (Ans. 8-9)), Appellants’ argument (App. Br. 8-9) that LaFleur’s capacitor is made of oxides that will not interact with the GaAs and the oxides of Heston, is not persuasive. (4) With respect to Rejection (4) (claim 12 rejected under 103 over Heston, Babcock, Adlerstein, Park, and Leipold (Ans. 9-10)), Appellants’ argument (App. Br. 9), is not persuasive. Furthermore, Appellants’ arguments (Reply Br. 5-8) concerning the methods or methodology of the references are not persuasive in view of the fact that claims 1-10 and 12 are apparatus claims. Finally, and most notably, the claims on appeal (including representative and sole independent claim 1) do not specify GaAs or SOI, they just define the substrate by function. “‘A reference may be said to teach away when a person of ordinary Appeal 2011-002767 Application 11/579,679 7 skill, upon reading the reference, would be discouraged from following the path set out in the reference, or would be led in a direction divergent from the path that was taken by the applicant.’†Ricoh Co. v. Quanta Computer, Inc., 550 F.3d 1325, 1332 (Fed. Cir. 2008) (citations omitted). A person of ordinary skill, upon reading Heston, would not be discouraged from following either path set out in Babcock or LaFleur (i.e., using a silicon based substrate or oxides), or would not be led in a direction divergent from the path that was taken by Appellants. Ricoh, 550 F.3d at 1332. This is especially true in light of Park’s disclosure (¶ [0004]) that GaAs and silicon substrates are alternatives. In summary, Appellants’ arguments in the Appeal Brief and Reply Brief do not convince us that the issues concerning SOI or silicon substrate devices do not have any relevance to GaAs substrate devices, and/or that the combinations of references would fail to operate to mitigate cross talk as recited in the claims on appeal. CONCLUSION The Examiner did not err in rejecting claims 1-10 and 12 as being unpatentable under 35 U.S.C. § 103(a). DECISION The Examiner’s rejections of claims 1-10 and 12 are affirmed. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(1)(iv). AFFIRMED Appeal 2011-002767 Application 11/579,679 8 llw Copy with citationCopy as parenthetical citation