Ex Parte Cho et alDownload PDFPatent Trial and Appeal BoardNov 27, 201713681012 (P.T.A.B. Nov. 27, 2017) Copy Citation United States Patent and Trademark Office UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O.Box 1450 Alexandria, Virginia 22313-1450 www.uspto.gov APPLICATION NO. FILING DATE FIRST NAMED INVENTOR ATTORNEY DOCKET NO. CONFIRMATION NO. 13/681,012 11/19/2012 Sangho Cho 74073-US-NP (DOW0003US) 2479 14268 7590 11/29/2017 The Dow Chemical Company/Cantor Colburn LLP 20 Church Street 22nd Floor Hartford, CT 06103-3207 EXAMINER BOYLE, ROBERT C ART UNIT PAPER NUMBER 1764 NOTIFICATION DATE DELIVERY MODE 11/29/2017 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): ffuimpc@dow.com u sptopatentmail @ C antorColburn .com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte SANGHO CHO, GUORONG SUN, KAREN L. WOOLEY, JAMES W. THACKERAY, and PETER TREFONAS III Appeal 2016-008234 Application 13/681,012 Technology Center 1700 Before TERRY J. OWENS, JAMES C. HOUSEL, and JEFFREY R. SNAY, Administrative Patent Judges. HOUSEL, Administrative Patent Judge. DECISION ON APPEAL1 Pursuant to 35 U.S.C. § 134(a), Appellants2 appeal from the Examiner’s decision rejecting claims 1, 5—7, and 10-12. We have jurisdiction over the appeal under 35 U.S.C. § 6(b). We AFFIRM. 1 Our Decision refers to the Specification (“Spec.”) filed April 2, 2015, Appellants’ Appeal Brief (“Appeal Br.”) filed February 16, 2016, the Examiner’s Answer (“Ans.”) dated July 1, 2016, and Appellants’ Reply Brief (“Reply Br.”) filed September 1, 2016. 2 The Appeal Brief identifies Applicants, ROHM AND HAAS ELECTRONICS LLC and THE TEXAS A&M UNIVERSITY SYSTEM (“Appellants”), as the real parties in interest. Appeal Br. 2. Appeal 2016-008234 Application 13/681,012 STATEMENT OF THE CASE The invention relates to a graft block copolymer and a method of manufacturing the copolymer. Spec, 5—6. The copolymer comprises a backbone polymer and a first graft polymer grafted onto the backbone polymer, wherein the first graft polymer includes a surface energy reducing moiety selected from a fluorine atom, a silicon atom, or a combination thereof. Id. 1 5. Claim 1, reproduced below from the Claims Appendix to the Appeal Brief, is illustrative of the subject matter on appeal. 1. A graft block copolymer comprising: a backbone polymer, where the backbone polymer is a polynorbomene; and a first graft polymer that comprises a surface energy reducing moiety; the first graft polymer being grafted onto the backbone polymer; where the surface energy reducing moiety comprises a fluorine atom, a silicon atom, or a combination of a fluorine atom and a silicon atom, where the first graft polymer is a poly(fluorostyrene), a poly(tetrafluoro-hydroxy styrene), or a combination thereof. Independent claim 7 recites a method of manufacturing a graft block copolymer comprising fluorostyrene and/or tetrafluoro-hydroxy styrene polymer grafted to polynorbomene backbone. Independent claim 12 recites an article comprising a cross-linked bottle-bmsh graft block copolymer comprising fluorostyrene and/or tetrafluoro-hydroxy styrene polymer grafted to polynorbomene backbone. REJECTIONS The Examiner maintains, and Appellants request our review of, the following grounds of rejection: 2 Appeal 2016-008234 Application 13/681,012 1. Claims 1, 5—7, and 10-12 on the ground of nonstatutory double patenting as unpatentable over claims 1—10 of copending U.S. Patent No. 9,447,220;3 2. Claims 1,5, and 6 on the ground of nonstatutory double patenting as unpatentable over claims 1—8 of copending U.S. Patent No. 8,822,130; 3. Claims 1,5, and 6 on the ground of nonstatutory double patenting as unpatentable over claims 1—11 of copending U.S. Patent No. 9,223,214;4 4. Claims 1, 5—7, and 10-12 under 35 U.S.C. § 103(a) as unpatentable over Li5 in view of Cho;6 3 The Examiner’s Answer presents this rejection as provisional based on claims 1—14 of copending U.S. Patent Application No. 13/681,002. Ans. 2. Subsequent to the Answer, this copending application matured into the above-cited U.S. patent with only claims 1—10. Therefore, we have corrected this rejection to reflect that it is no longer provisional and is based on the claims of the issued patent. 4 The Examiner’s Answer presents this rejection as provisional based on claims 1—14 of copending U.S. Patent Application No. 13/681,026. Ans. 2. Subsequent to the Answer, this copending application matured into the above-cited U.S. patent with only claims 1—11. Therefore, we have corrected this rejection to reflect that it is no longer provisional and is based on the claims of the issued patent. 5 Zhou Li et al., Dynamic Cylindrical Assembly of Triblock Copolymers by a Hierarchical Process of Covalent and Supramolecular Interactions, J. Am. Chem. Soc. 133, 1228-1231 (2011) (“Li”). 6 Sungseo Cho et al., Investigation of a Fluorinated ESCAP based Resist for 157 nm Lithography, Adv. Resist Tech, and Processing XIX, Proc. SPIE 4690, 522-532 (2002) (“Cho”). 3 Appeal 2016-008234 Application 13/681,012 5. Claims 1, 5—7, and 10—12 under 35 U.S.C. § 103(a) as unpatentable over Liaw7 in view of Klauck-Jacobs8 and Sounik;9 and 6. Claims 1, 5—7, and 10-12 under 35 U.S.C. § 103(a) as unpatentable over Liaw in view of Klauck-Jacobs and Cheng.10 ANALYSIS Rejections 1—3: Obviousness-type Double Patenting Appellants fail to respond to or otherwise contest these nonstatutory double patenting rejections. See generally Appeal Br. and Reply Br. Accordingly, we summarily affirm the Examiner’s nonstatutory double patenting rejections. Ans. 2—3. Rejection 4: Obviousness over Li in view of Cho Appellants do not argue the claims separately, instead focusing on the limitations of claim 1 only. In accordance with 37 C.F.R. § 41.37(c)(l)(iv), claims 5—7 and 10—12 stand or fall with claim 1. After review of the opposing positions articulated by Appellants and the Examiner, the applied prior art, and Appellants’ claims, declaration evidence, and Specification disclosures, we determine that Appellants’ arguments are insufficient to identify reversible error in the Examiner’s 7 Liaw et al., US 2005/0182220 Al, published August 18, 2005 (“Liaw”). 8 Klauck-Jacobs et al., US 2002/0058198 Al, published May 16, 2002 (“Klauck-Jacobs”). 9 Sounik et al., US 2004/0248039 Al, published December 9, 2004 (“Sounik”). 10 Cheng et al., US 2010/0022741 Al, published January 28, 2010 (“Cheng”). 4 Appeal 2016-008234 Application 13/681,012 obviousness rejection. In re Jung, 637 F.3d 1356, 1365 (Fed. Cir. 2011). Accordingly, we affirm the stated obviousness rejections for substantially the fact findings and the reasons set forth by the Examiner in the Examiner’s Answer, which we adopt as our own. We offer the following for emphasis only. The Examiner finds Li teaches the copolymer of claim 1 including a first graft polymer except for the provision of a surface energy reducing moiety, such as fluorine, on the graft polymer. Ans. 3. However, the Examiner finds Cho teaches fluorinated polymers derived from fluorostyrene and 4-hydroxytetrafluorostyrene which fall within the scope of claim 1 and provide resist materials that have reduced absorbance, form good films, have acceptable thermal stability, and show good dry etch resistance. Id. at 4. In addition, the Examiner finds Cho teaches the fluorinated polymers have increased phenolic group acidity resulting in an increased dissolution rate. Therefore, the Examiner concludes it would have been obvious to use fluorinated styrene monomers, including hydroxytetrafluorostyrene, in the graft polymers of Li because they provide resist materials having improved properties. Id. Appellants argue that neither Li nor Cho reasonably motivate the specific selection of a grafted polymer having a surface energy reducing moiety comprising fluorine or silicon in combination with the other constituents of claim 1. Appeal Br. 6. According to Appellants, Cho teaches fluorinated materials having lower absorbances than poly(hydroxytetrafluorostyrene) and would be more suitable for combination with Li. Id. Appellants also contend that because Cho teaches poly(hydroxytetrafhiorostyrene) decomposes at 125°C, the ordinary artisan 5 Appeal 2016-008234 Application 13/681,012 would not be motivated to select this polymer because it was well-known in the preparation of photoresists to perform a conventional baking step at temperatures of 150—350°C. Id. at 6—7. For the reasons given by the Examiner (Ans. 9—11), which we adopt as our own, Appellants’ arguments are not persuasive. In particular, we note Appellants admit that the ordinary artisan “desirous or using a material having the best absorption characteristics . . . would have . . . selected a fully fluorinated styrene that does not contain hydroxyl groups as can be seen in the Tables 1 and 2 of Cho.” Appeal Br. 6. As the Examiner notes (Ans. 9), Appellants’ claim 1 is directed not only to the use of poly(tetrafluoro-hydroxy styrene) as the first graft polymer, but alternatively to the use of poly(fluorostyrene) as this first graft polymer. See claim 1. Appellants disclose that the first graft polymer may be “a poly(fluorostyrene) having 1 to 5 fluorine substituents on the styrenic moiety.” Spec. 129. Accordingly, the scope of claim 1 includes each of the fluorinated styrene monomers of Cho’s Table 1, including the fully fluorinated styrene which Appellants admit would have been obvious to one of ordinary skill in the art for use in Li. Notwithstanding Appellants’ admission, we agree with the Examiner the fact that other fluorinated styrene monomers have better absorbances than hydroxytetrafluorostyrene, polymer J in Cho, does not teach away from or otherwise render hydroxytetrafluorostyrene unobvious. See Ans. 9-10, citing In re Lamberti, 545 F.2d 747 (CCPA 1976) and In re Mills, 470 F.2d 649 (CCPA 1972). “A reference does not teach away, however, if it merely expresses a general preference for an alternative invention but does not ‘criticize, discredit, or otherwise discourage’ investigation into the invention 6 Appeal 2016-008234 Application 13/681,012 claimed.” DePuy Spine, Inc. v. Medtronic Sofamor Danek, Inc., 567 F.3d 1314, 1327 (Fed. Cir. 2009) (citing In re Fulton, 391 F.3d 1195, 1201 (Fed. Cir. 2004)). Moreover, “in a section 103 inquiry, ‘the fact that a specific [embodiment] is taught to be preferred is not controlling, since all disclosures of the prior art, including unpreferred embodiments, must be considered.’” Merck & Co. v. Biocraft Laboratories Inc., 874 F.2d 804, 807 (Fed. Cir. 1989) (quoting In re Lamberti, 545 F.2d at 750.); cf In re Burckel, 592 F.2d 1175, 1179 (CCPA 1979). Indeed, each of the fluorinated monomer alternatives set forth in Cho’s Tables 1 and 2 provide a reduced absorbance over the non-fluorinated monomer and, therefore, the ordinary artisan would have had a reasonable expectation of improved results with each of the fluorinated monomer alternatives of Cho, not just with the fully fluorinated, non-hydroxyl group containing monomer. Furthermore, as the Examiner finds (Ans. 10), Cho teaches the acidic fluorinated phenol monomer contributes to a high dissolution rate which would have motivated the ordinary artisan to select fluorinated styrene monomers having a hydroxyl moiety, including hydroxytetrafluorostyrene, for their improved dissolution rate as well as their reduced absorbance. We are likewise not persuaded by Appellants’ argument that one of ordinary skill in the art would not select a polymer such as poly(tetrafluoro- hydroxy styrene) as the first graft polymer in Li because Cho teaches this polymer decomposes at 125°C, well below the conventional baking temperatures of 150—350°C employed in the preparation of photoresists. As the Examiner finds (Ans. 10), Appellants’ claims do not recite a baking step or baking temperatures. In addition, the Examiner finds Li uses temperatures well below this range. Id. Cho also uses temperatures well 7 Appeal 2016-008234 Application 13/681,012 below this range. Cho 523 (“Polymers were coated on a bare silicon substrate followed by a 110 °C bake for 60 seconds.”) As such, Appellants have not persuasively shown that Cho’s fluorinated polymers, including polyhydroxytetrafluorostyrene, would not have been used in Li because of a mismatch between decomposition temperatures and the baking temperature. Appellants argue that the Declaration under 37 C.F.R. 1.132 of Guorong Sun (“Declaration”) evaluates the results of certain properties when the claimed graft block copolymer is baked at different temperatures. Appeal Br. 9. In particular, the Declaration presents data on film thickness upon annealing of the copolymer at temperatures over 140°C for one hour. Id.', Declaration | 5. Appellants indicate that the Declaration shows film thickness after annealing increases significantly compared to no annealing and that upon annealing under such conditions, only a low extent of crosslinking is induced. Appeal Br. 9; see also Declaration | 6. The Declaration further presents data from annealing the claimed graft block copolymer at 90°C and 120°C. Appeal Br. 10; Declaration || 7—8. According to Appellants, annealing at the higher temperature results in significantly more crosslinking and a significant decrease in patterned line height. Appeal Br. 11; Declaration 19. Finally, the Declaration presents data on the claimed graft block copolymer annealed at 90°C and evaluated at different, decreasing e-beam lithography (EBL) exposure dosages. Appeal Br. 11—12; Declaration 19. Appellants assert that this data shows a significant improvement in the three-dimensional features of patterned areas when exposed to comparatively lower exposure dosage due to a decrease of crosslinking in the space areas. Appeal Br. 12; Declaration 19. 8 Appeal 2016-008234 Application 13/681,012 As the Examiner notes (Ans. 12), Appellants fail to explain the relevance of the Declaration data to the obviousness of claim 1 over Li in view of Cho. Appellants’ claims do not recite any annealing step or temperature, nor any property that is allegedly improved as a result of such annealing. Appellants’ claims also do not recite any lithography step, exposure dosage, nor any property that is allegedly improved as a result of an exposure dosage. In re Klosak, 455 F.2d 1077, 1080 (CCPA 1972) (noting that the burden of analyzing and explaining data to support nonobviousness rests with Appellants); see also, In re Borkowski, 505 F.2d 713, 718 (CCPA 1974) (it is the Appellants’ burden to decipher declaration evidence and explain its content). In addition, the Examiner determines the Declaration is neither commensurate in scope with the claims11 nor a comparison to the closest prior art.12 Ans. 11—12. For example, the Declaration only tested poly(tetrafluoro-hydroxy styrene) as the first graft polymer, whereas claim 1 recites poly(fluorostyrene) as an alternative first graft polymer. Declaration 3, 7, and 8. In addition, the tested graft block copolymer includes a second graft polymer, poly(para-hydroxy styrene-co-N-phenyl maleimide), whereas the claims do not recite a second graft polymer. The Declaration fails to test, for comparison, any other first graft polymers, including the non-fluorinated polymers of Li or the remaining fluorinated polymers of Cho. 11 See In re Grasselli, 713 F.2d 731, 743 (Fed. Cir. 1983); In re Clemens, 622 F.2d 1029, 1035 (CCPA 1980); In re Hyson, 453 F.2d 764, 786 (CCPA 1972). 12 See In re Baxter Travenol Labs., 952 F.2d 388, 392 (Fed. Cir. 1991). 9 Appeal 2016-008234 Application 13/681,012 For these reasons, the Declaration is of little probative value in weighing the evidence relative to the Examiner’s prima facie case of obviousness over the combination of Li and Cho. Appellants next argue that the Specification provides evidence of unexpected results. Appeal Br. 13. Appellants specifically direct our attention to Examples 5—10 in support of unexpected results. Appellants assert that when a polyhydroxystyrene is grafted onto a polynorbomene backbone, as shown in Examples 7 and 8, there is a low degree of order as compared to films from poly(tetrafluoro-para-hydroxy styrene) grafted onto a polynorbomene backbone, as shown in Examples 5 and 6. Id. at 14. Appellants further assert that thin films formed from the copolymers of Examples 5, 6, and 7 are exposed to radiation and annealed, as described in Example 10, the films from the polymers of Examples 5 and 6 “could create patterns with full line integrities at each exposure dosage.” Id. Appellants urge that the film formed from the polymer of Example 7 “only had rational features for the 50 to 100 nm designed lines (Figure 4F), even at the relatively higher dosage (400 pC/cm2).” Id. Appellants also urge that Figure 4F for the Example 7 polymer shows “significantly greater line edge roughening when compared with Figures 4A — 4D” for the Examples 5 and 6 polymers. Id. Appellants’ arguments and Specification evidence are insufficient to demonstrate unexpected results for the claimed invention. Initially, we note that nowhere in the record, including the Declaration and the Specification, do Appellants establish that the results shown in Declaration and the Specification would have been unexpected to one of ordinary skill in the art. Appellants’ attorney argument is insufficient alone to establish that the 10 Appeal 2016-008234 Application 13/681,012 evidence presented in either the Declaration or the Specification was unexpected. In re Geisler, 116 F.3d 1465, 1471 (Fed. Cir. 1997) (Geisler made no such assertion [that results were unexpected] in his application. Nor did Geisler submit any such statement through other evidentiary submissions, such as an affidavit or declaration under Rule 132 ... . Instead, the only reference to unexpected results was a statement by Geisler’s counsel. . . that Geisler’s results were ‘surprising.’). Appellants’ attorney arguments to that effect cannot take the place of evidence. In re De Blauwe, 736 F.2d 699, 705 (Fed. Cir. 1984); In re Greenfield, 571 F.2d 1185, 1189 (CCPA 1978); In re Pearson, 494 F.2d 1399, 1405 (CCPA 1974). Moreover, a party asserting unexpected results as evidence of nonobviousness has the burden of proving that the results are unexpected. In re Geisler, 116 F.3d at 1469-70. Such burden requires Appellants to proffer factual evidence that actually shows unexpected results relative to the closest prior art, In re Baxter Travenol Labs, supra, and that is reasonably commensurate in scope with the protection sought by claim 1 on appeal, In re Grasselli supra', In re Clemens supra', In re Hyson supra. “[I]t is not enough to show that results are obtained which differ from those obtained in the prior art: that difference must be shown to be an unexpected difference.” In re Klosak, 455 F.2d 1077 at 1080. The extent of the showing relied upon by Appellants also must reasonably support the entire scope of the claims at issue. See In re Harris, 409 F.3d 1339, 1344 (Fed. Cir. 2005). Here, the Examiner has established that one of ordinary skill in the art reasonably would have expected the use of fluorinated polymers of polystyrene and polyhydroxystyrene in Li would have provided improved 11 Appeal 2016-008234 Application 13/681,012 results due to their reduced absorbance. Ans. 9. Appellants fail to show poly(fluorostyrene) and poly(tetrafluoro hydroxy styrene) yield results that would have been unexpected by one of ordinary skill in the art even in light of the expected improved results due to their known reduced absorbance. In addition, we note that Figures 3 A—3C depict photomicrograph atomic force images and Figures 4A-4H depict tapping mode AFM images of patterns, but none of these images provides data for quantitative comparison, much less image quality sufficient for qualitative comparison. Appellants also fail to direct our attention to data in the Specification for quantitative comparison, nor do we find any. The only qualitative comparison possibly described in the Specification is the description of Figure 3 A showing the polymer of Example 7 suggesting the formation of cylindrical assemblies of low degrees of order and “noticeable phase separation,” whereas Figures 3B and 3C showing the polymers of Examples 5 and 6 “exhibit[] sufficiently homogenous surface topology.” Spec. Tflf 104 and 105; Appeal Br. 13. However, Appellants do not discuss this qualitative comparison or otherwise explain how it is sufficient to establish unexpected results. The Specification data is also neither commensurate in scope with the claims nor a comparison to the closest prior art for substantially the same reasons as given above for the Declaration. The Specification Examples cover only poly(tetrafluoro hydroxy styrene), and do not test any poly(fluorostyrene) within the scope of claim 1. Moreover, the graft block copolymers tested include a second graft polymer, poly(para-hydroxy styrene-co-N-phenyl maleimide), whereas the claims do not recite a second graft polymer. Finally, the Specification tests for comparison only a single non-fluorinated graft polymer, polyhydroxystyrene, and not any other first 12 Appeal 2016-008234 Application 13/681,012 graft polymers, including the polystyrene of Li or the remaining fluorinated polymers of Cho. For these reasons and those given by the Examiner (Ans. 13—16), we are not persuaded that Appellants have carried their burden of establishing unexpected results. In their Reply Brief, Appellants argue for the first time: 1) that “[substituting the hydrophobic polystyrene of Li with a hydrophilic poly (hydroxyl tetrafluorostyrene) would place a hydrophilic moiety near the polynorbomene;” 2) that Li teaches the participation of norbomenyl in multiple radical polymerization steps, if not conducted correctly, may destroy the later conversion to the molecular brush topology; and 3) the increased solubility taught by Cho may hinder participation of the polynorbomene in the multiple polymerization reactions. Reply Br. 2—3. However, Appellants have not shown any good cause explaining why these arguments were not raised in the Appeal Brief. Therefore, these arguments have been waived and will not be considered. See 37 C.F.R. § 41.41(b)(2); In re Hyatt, 211 F.3d 1367, 1373 (Fed. Cir. 2000) (noting that an argument not first raised in the brief to the Board is waived on appeal); Ex parte Nakashima, 93 USPQ2d 1834 (BPAI 2010) (informative) (explaining that arguments and evidence not timely presented in the principal Brief will not be considered when filed in a Reply Brief, absent a showing of good cause explaining why the argument could not have been presented in the Principal Brief); Ex parte Borden, 93 USPQ2d 1473, 1477 (BPAI 2010) (informative) (“Properly interpreted, the Rules do not require the Board to take up a belated argument that has not been addressed by the Examiner, absent a showing of good cause.”). 13 Appeal 2016-008234 Application 13/681,012 Rejections 5 and 6: Obviousness over Liaw in view of Klauck-Jacobs and either Sounik or Cheng Appellants do not argue the claims separately, instead focusing on the limitations of claim 1 only. In accordance with 37 C.F.R. § 41.37(c)(l)(iv), claims 5—7 and 10—12 stand or fall with claim 1. After review of the opposing positions articulated by Appellants and the Examiner, the applied prior art, Appellants’ claims, declaration evidence, and Specification disclosures, we determine that Appellants’ arguments are insufficient to identity reversible error in the Examiner’s obviousness rejection. In re Jung, 637 F.3d 1356, 1365 (Fed. Cir. 2011). Accordingly, we affirm the stated obviousness rejections for substantially the fact findings and the reasons set forth by the Examiner in the Examiner’s Answer, which we adopt as our own. We offer the following for emphasis only. The Examiner finds Liaw teaches the copolymer of claim 1 including a first graft polymer except for the provision of a surface energy reducing moiety, such as fluorine, on the graft polymer. Ans. 5—6 and 7. However, the Examiner finds Klauck-Jacobs teaches fluorinated polymers derived from fluorostyrene and hydroxytetrafluorostyrene which fall within the scope of claim 1 and that provide good transparency at extremely short wavelengths for highly resolved relief images. Id. at 6 and 7. Therefore, the Examiner concludes it would have been obvious to use fluorinated styrene monomers in the graft polymers of Liaw because they provide good transparency as desired by Liaw for producing highly resolved relief images. Id. 14 Appeal 2016-008234 Application 13/681,012 In addition, the Examiner finds Sounik teaches preparation of photoresist compositions using RAFT polymerization and chain transfer agents including dithioesters for enhanced purity and low polydispersity. Id. Alternatively, the Examiner finds Cheng teaches preparation of crosslinked brush copolymers using ROMP and RAFT polymerization and dithioester with a higher degree of control over the entire macromolecular architecture which avoids complicated and time consuming procedures, where the product is a polynorbomene backbone and polystyrene side chains. Id. at 8. Appellants argue only the combination of Liaw and Klauck-Jacobs, and do not challenge the application of Sounik or Cheng. Appeal Br. 18. Accordingly, we restrict our review to the combination of Liaw and Klauck- Jacobs only. Appellants argue that Klauck-Jacobs suffers from the same drawbacks as Cho “because poly(4-hydroxyfluorostyrene) degrades at low temperatures as disclosed by Cho (and where Klauck[-Jacobs] is also a contributor.)” Id. at 18—19. However, as set forth above, we did not find any deficiency in Cho nor were we persuaded that the initial decomposition temperature of poly(4-hydroxyfluorostyrene) negated its use in the formation of a graft brush copolymer with a polynorbomene backbone because the prior art teaches use of annealing temperatures well below this decomposition temperature. Ans. 17; Klauck-Jacobs 179. Appellants further argue that the ordinary artisan would not substitute poly(4-hydroxyfluorostyrene) for Liaw’s polystyrene because Liaw’s Example 7 prepares the copolymer at a temperature of 130°C, which is above the decomposition temperature of poly(4-hydroxyfluorostyrene). Appeal Br. 19. We are not persuaded by this argument because Liaw 15 Appeal 2016-008234 Application 13/681,012 teaches preparation of the grafted polynorbomene copolymer at temperatures ranging from 50—150°C. Liaw ]Hf 29, 40, 48, etc., for example. Thus, the ordinary artisan would have selected a temperature within this range appropriate for the materials used. KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 421 (2007) (A person of ordinary skill in the art is also a person of ordinary creativity, not an automaton.) Appellants also argue that they have shown that the claimed invention demonstrates unexpected results. Appeal Br. 19. However, for the reasons given above with regard to Rejection 5, we disagree. As such, we are not persuaded that the claimed invention demonstrates unexpected results, much less unexpected results sufficient to overcome the Examiner’s prima facie case of obviousness over Liaw in view of Klauck-Jacobs. In their Reply Brief, Appellants argue for the first time that the ordinary artisan would not replace the polystyrene of Liaw with the poly(hydroxytetrafluorostyrene) of Klauck-Jacobs “because its inclusion would possible perturb the reaction of the polynorbomene with the poly(hydroxyl tetrafluorostyrene) such that it would not be possible to form the desired bmsh copolymers.” Reply Br. 3^4. However, Appellants have not shown any good cause explaining why this argument was not raised in the Appeal Brief. Therefore, this argument has been waived and will not be considered. See 37 C.L.R. § 41.41(b)(2). DECISION Upon consideration of the record, and for the reasons given above and in the Examiner’s Answer, the decision of the Examiner rejecting claims 1, 5—7, and 10-12 under 35 U.S.C. § 103(a) as unpatentable over Li in view of 16 Appeal 2016-008234 Application 13/681,012 Cho, and Liaw in view of Klauck-Jacobs and either Sounik or Cheng, is affirmed. In addition, the decision of the Examiner rejecting on the ground of nonstatutory double patenting claims 1, 5—7, and 10-12 as unpatentable over claims 1—10 of copending U.S. Patent No. 9,447,220; claims 1, 5, and 6 as unpatentable over claims 1—8 of copending U.S. Patent No. 8,822,130; and claims 1, 5, and 6 as unpatentable over claims 1—11 of copending U.S. Patent No. 9,223,214, is affirmed. No time period for taking any subsequent action in connection with this appeal may be extended under 37 C.F.R. § 1.136(a)(1). AFFIRMED 17 Copy with citationCopy as parenthetical citation