Ex Parte Yasuda et alDownload PDFPatent Trials and Appeals BoardJul 9, 201913963796 - (D) (P.T.A.B. Jul. 9, 2019) Copy Citation UNITED STA TES p A TENT AND TRADEMARK OFFICE APPLICATION NO. 13/963,796 110647 7590 Sheridan Ross P.C. 1560 Broadway Suite 1200 Denver, CO 80202 FILING DATE FIRST NAMED INVENTOR 08/09/2013 Shuichiro Yasuda 07/11/2019 UNITED STATES DEPARTMENT OF COMMERCE United States Patent and Trademark Office Address: COMMISSIONER FOR PATENTS P.O. Box 1450 Alexandria, Virginia 22313-1450 www .uspto.gov ATTORNEY DOCKET NO. CONFIRMATION NO. 6810-703 1071 EXAMINER MUNOZ, ANDRES F ART UNIT PAPER NUMBER 2894 NOTIFICATION DATE DELIVERY MODE 07/11/2019 ELECTRONIC Please find below and/or attached an Office communication concerning this application or proceeding. The time period for reply, if any, is set in the attached communication. Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the following e-mail address(es): sony@sheridanross.com edocket@sheridanross.com spowers@sheridanross.com PTOL-90A (Rev. 04/07) UNITED STATES PATENT AND TRADEMARK OFFICE BEFORE THE PATENT TRIAL AND APPEAL BOARD Ex parte SHUICHIRO YASUDA, DALE COLLINS, and SCOTT E. SILLS Appeal2018-007038 Application 13/963,796 Technology Center 2800 Before N. WHITNEY WILSON, MICHAEL G. McMANUS, and MERRELL C. CASHION, JR., Administrative Patent Judges. CASHION, Administrative Patent Judge. DECISION ON APPEAL STATEMENT OF CASE Pursuant to 35 U.S.C. § 134(a), Appellant 1 appeals from a Final Action of claims 16-21 and 23-32. We have jurisdiction under 35 U.S.C. § 6(b ). We reverse. 1 Sony Semiconductor Solutions Corporation is the Applicant/ Appellant and is also identified as the real party in interest. App. Br. 2. Appeal2018-007038 Application 13/963,796 The invention is directed to a non-volatile memory array. Spec. ,r 1. Claim 16 illustrates the subject matter claimed and is reproduced below: 16. A non-volatile memory system comprising: a dielectric layer having a hole; a first electrode deposited in the hole of the dielectric layer; a memory switching layer deposited in the hole and in direct physical contact with the first electrode and the dielectric layer; an ion source layer in direct physical contact with the memory switching layer and the dielectric layer, and on a side of the memory switching layer opposite the first electrode; and a second electrode including: an interface layer in direct physical contact with the ion source layer, wherein the interface layer is chemically and mechanically bonded to the ion source layer; and a cap layer in direct physical contact with the interface layer. Independent claim 32 is also directed to a non-volatile memory system but differs from the subject matter of claim 1 in that claim 32 further requires the first electrode, second electrode, memory switching layer, and ion source layer reside within the hole of the dielectric layer. Appellant requests review of the following rejections maintained by the Examiner: I. Claims 16-21 and 23-32 rejected under 35 U.S.C. § 103 as unpatentable over Yasuda (US 2009/0173930 Al, published July 9, 2009) and Lin (US 2011/0180775 Al, published July 28, 2011). II. Claims 16, 26-28, and 32 rejected under 35 U.S.C. § 103 as unpatentable over Mizuguchi (US 2011/0155987 Al, published June 30, 2011) and Lin. 2 Appeal2018-007038 Application 13/963,796 OPINI0N2 After review of the respective positions the Appellant provides in the Appeal and Reply Briefs and the Examiner provides in the Final Action and the Answer, we reverse the Examiner's prior art rejections of claims 16-21 and 23-32 under 35 U.S.C. § 103 essentially for the reasons the Appellant presents in the Appeal and Reply Briefs. We add the following for emphasis. We refer to the Examiner's Final Action for a complete statement of the rejections. Final Act. 3-16. Briefly, the Examiner finds that each of Yasuda and Mizuguchi discloses a non-volatile memory system that differs from the claimed invention in that the they do not disclose a non-volatile memory system as comprising at least an ion source layer in direct physical contact with the memory switching layer and the dielectric layer as claimed. Final Act. 3--4, 11-12; Yasuda Figure 1; ,r,r 25-36; Mizuguchi Figure 1, ,r,r 24--33. The Examiner relies on Lin's teachings for the missing feature. According to the Examiner, Lin discloses a memory switching layer (64) deposited in the hole ( of dielectric layer 67 A/67B) and in direct physical contact with the first electrode (65) and the dielectric layer (67 A/67B). Final Act. 5, 12-13; Lin Figures 6, 8, ,r,r 9, 57. The Examiner further explains in the Answer that Yasuda and Mizuguchi both disclose an ion source layer in direct physical contact with the memory switching layer and Lin discloses the ion source layer 62 in direct physical contact with the dielectric layer 67A/67B. Ans. 4--5, 14--15; Yasuda Figure 1, i-fi-f 25-36; MizuguchiFigure 2 We limit our discussion to independent claim 16 for both rejections. The Appellants' persuasive arguments regarding claim 16 are equally applicable the rejections of claim 32. 3 Appeal2018-007038 Application 13/963,796 1, i-fi-f24-33; Lin Figure 6. From these disclosures, the Examiner determines that it would have been obvious to one of ordinary skill in the art to modify Yasuda's and Mizuguchi's layer structure to incorporate Lin's arrangement/layers because of (1) various benefits and (2) it would be routine rearrangement of parts by one skilled in the art. Final Act. 6-7, 13; Ans. 8, 16. Appellant argues that Lin does not teach at least an ion source layer in direct physical contact with the memory switching layer and the dielectric layer as claimed. App. Br. 9, 16. According to Appellant, Lin teaches the ion source layer 62 is not in direct physical contact with the memory switching layer 64 because there is a TiTe compound 63 between them. App. Br. 10. That is, Appellant contends that the Examiner has not explained how one skilled in the art would arrive at the claimed invention from the combined teachings of the cited art. Id. We agree with Appellant that there is reversible error in the Examiner's determination of obviousness. "[R ]ejections on obviousness grounds cannot be sustained by mere conclusory statements; instead, there must be some articulated reasoning with some rational underpinning to support the legal conclusion of obviousness." In re Kahn, 441 F.3d 977, 988 (Fed. Cir. 2006), quoted with approval in KSR Int 'l Co. v. Teleflex Inc., 550 U.S. 398, 418 (2007). While the Examiner contends that each reference discloses a partial layer association that meets part of the claimed layer structure (Ans. 4--5, 14--15), the Examiner has not provided an adequate technical explanation of why or how one skilled in the art would have arrived at the claimed layer arrangement from the combined teachings of the cited art. The Examiner 4 Appeal2018-007038 Application 13/963,796 has not adequately explained why Lin's arrangement of an ion source layer in direct physical contact with the dielectric layer would have been suitable for either Yasuda's or Mizuguchi's non-volatile memory systems. The Examiner's contention that the combined references result in various benefits (Ans. 5, 16) is also unpersuasive because it is unsupported by objective evidence and is, at best, speculatory. Thus, the Examiner does not provide the requisite rational underpinning explaining why a person of ordinary skill in the art would have arrived at the claimed invention from the teachings of the cited art. Accordingly, we reverse the Examiner's prior art rejections under 35 U.S.C. § 103 for the reasons presented by Appellant and given above. ORDER The Examiner's prior art rejections of claims 16-21 and 23-32 under 35 U.S.C. § 103 are reversed. REVERSED 5 Copy with citationCopy as parenthetical citation