Ex Parte Lamers et alDownload PDFPatent Trial and Appeal BoardOct 31, 201211502277 (P.T.A.B. Oct. 31, 2012) Copy Citation UNITED STATES PATENT AND TRADEMARK OFFICE ________________ BEFORE THE PATENT TRIAL AND APPEAL BOARD ________________ Ex parte KRISTINA L. LAMERS and R. SHANE FAZZIO ________________ Appeal 2010-005333 Application 11/502,277 Technology Center 2800 ________________ Before JOSEPH F. RUGGIERO, BRADLEY W. BAUMEISTER, and JENNIFER L. MCKEOWN, Administrative Patent Judges. MCKEOWN, Administrative Patent Judge. DECISION ON APPEAL This is an appeal under 35 U.S.C. § 134(a) from the Examiner‟s rejection of claims 14-28. We have jurisdiction under 35 U.S.C. § 6(b). We affirm. Appeal 2010-005333 Application 11/502,277 2 SUMMARY Appellants appeal from the Examiner‟s rejections of claims 14-28: Claims 14, 16, 19, 20, 24, and 26-28 stand rejected under 35 U.S.C. § 103(a) as obvious over Subramanian (US 2006/0055048 A1; published Mar. 16, 2006) and Gelorme (US 4,882,245; Nov. 21, 1989). Claim 15 stands rejected under 35 U.S.C. § 103(a) as obvious over Subramanian, Gelorme, and Park (US 2005/0230767 A1; published Oct. 20, 2005). Claims 17, 18, and 23 stand rejected under 35 U.S.C. § 103(a) as obvious over Subramanian, Gelorme, and Cheng (US 6,689,643 B2; Feb. 10, 2004). Claim 21 stands rejected under 35 U.S.C. § 103(a) as obvious over Subramanian, Gelorme, and Ozgur (US 2003/0104649 A1; published June 5, 2003). Claims 22 and 25 stand rejected under 35 U.S.C. § 103(a) as obvious over Subramanian, Gelorme, and Benavides (US 6,821,819 B1; Nov. 23, 2004). STATEMENT OF CASE According to Appellants, the present invention is directed to “[a]n etch-stop layer and method of use . . . .” (Abstract.) Independent claim 14 is illustrative and is reproduced below with key disputed limitations emphasized: 14. A semiconductor device configured for microfluidic applications, comprising: a substrate having first and second opposing sides; Appeal 2010-005333 Application 11/502,277 3 an opening in the substrate configured as a channel for fluid flow therethrough; and an etch-stop and photoresist layer disposed on the first side of the substrate and in contact therewith, the layer being disposed over the opening, layer comprising a photolithographically patternable epoxy and having sufficient structural integrity to span the opening while not sagging into or over the opening. CONTENTIONS The Examiner finds that Subramanian discloses every limitation of claim 14, except for the disclosed etch stop photoresist layer being composed of a photolithographically patternable epoxy having sufficient structural integrity to span the opening while not sagging into or over the opening. (Ans. 3, 7-8.) The Examiner, however, relies on Gelorme to teach or suggest this feature. (Ans. 4, 8.) Appellants contend, inter alia, that Subramanian and Gelorme, collectively, fail to teach (1) a semiconductor device configured for microfluidic applications, (2) the semiconductor device comprising an etch- stop and photoresist layer disposed on a first side of a substrate and in contact therewith, the layer being disposed over an opening configured as a channel for fluid flow therethrough, and (3) the layer comprising a photolithographically patternable epoxy having sufficient structural integrity to span the opening while not sagging into or over the opening. (App. Br. 41-43; Reply Br. 12-15.) Appellants also present four arguments as to why one of ordinary skill would not have combined Subramanian with Gelorme to arrive at the claimed invention. (App. Br. 44-46; Reply Br. 15-16.) First, Appellants Appeal 2010-005333 Application 11/502,277 4 contend that there are elements missing from the cited combination. (App. Br. 44-46; Reply Br. 15-16.) Second, Appellants argue that neither of the cited references recognizes the problems solved by the claimed invention. (App. Br. 44-46; Reply Br. 15-16.) Third, Appellants state that there is no “teaching[,] suggestion[,] or motivation anywhere in the Gelorme or Subramanian references to produce the claimed invention.” (App. Br. 44- 46; Reply Br. 15-16.) And fourth, Appellants maintain that there is no suggestion in the cited combination as to the direction of experimentation to obtain the claimed invention. (App. Br. 44-46; Reply Br. 15-16.) With respect to the obviousness rejection of dependent claim 15, Appellants dispute that Parks teaches a sealing layer. (App. Br. 47-51.) ISSUES 1. Under § 103, has the Examiner erred by finding that Subramanian and Gelorme collectively would have taught or suggested: (a) a semiconductor device configured for microfluidic applications? (b) an etch-stop and photo-resist layer disposed on a first side of a substrate and in contact therewith, the layer being disposed over an opening configured as a channel for fluid flow therethrough? (c) a layer comprising a photolithographically patternable epoxy having sufficient structural integrity to span the opening while not sagging into or over the opening? 2. Is the Examiner‟s reason to combine the teachings of the cited references supported by articulated reasoning with some rational underpinning to justify the Examiner‟s obviousness conclusion? Appeal 2010-005333 Application 11/502,277 5 3. Under § 103, has the Examiner erred by finding that Subramanian, Gelorme, and Park collectively would have taught or suggested a sealing layer? ANALYSIS THE OBVIOUSNESS REJECTION OF CLAIMS 14, 16, 19, 20, 24, AND 26-28 Claim 14 On this record, we find no error in the Examiner‟s obviousness rejection of claim 14. First, Appellants argue that Subramanian and Gelorme collectively do not teach “[a] semiconductor device configured for microfluidic applications.” (App. Br. 41; Reply Br. 12-13.) Notably, this limitation is recited only in the preamble of claim 14. While “a preamble [may] limit[] the invention if it recites essential structure or steps, or if it is „necessary to give life, meaning, and vitality‟ to the claim,” Catalina Mktg. Int’l, Inc. v. Coolsavings.com, Inc., 289 F.3d 801, 808 (Fed. Cir. 2002) (quoting Pitney Bowes, Inc. v. Hewlett-Packard Co., 182 F.3d 1298, 1305 (Fed. Cir. 1999)), Appellants present neither argument here. Instead, Appellants merely recite the preamble language and state that the cited references fail to teach this feature. This is insufficient to persuade us that the preamble is more than a statement of intended use or that the language would further structurally limit the claimed invention. Nonetheless, Subramanian‟s through-wafer vias are “microfluidic interconnects” in devices, such as MEMS devices or microfluidic devices. (Ans. 3 (citing Subramanian ¶ [0017]).) Thus, Subramanian does in fact teach a semiconductor device configured for microfluidic applications. Appeal 2010-005333 Application 11/502,277 6 Appellants dispute that Subramanian teaches “a photo-resist layer disposed on a first side of a substrate and in contact therewith, the layer being disposed over an opening.” (App. Br. 41.) In response, the Examiner identifies that Subramanian describes that “a photo-resist can be used as the mask/etch-stop material . . . .” (Ans. 7, 9 (citing Subramanian ¶ [0019]).) Appellants fail to rebut this determination, and, accordingly, we see no error in the Examiner‟s findings. Next, Appellants contend that Gelorme does not teach an etch stop layer. (App. Br. 29.) However, the Examiner concludes, and Appellants admit, that Subramanian discloses the claimed etch stop layer (App. Br. 27); Gelorme need not also teach this limitation. One cannot show nonobviousness by attacking references individually where the rejections are based on combinations of references. See In re Merck & Co., Inc., 800 F.2d 1091, 1097 (Fed. Cir. 1986); In re Keller, 642 F.2d 413, 426 (CCPA 1981). Appellants also assert that neither Subramanian nor Gelorme teaches a layer comprising a photolithographically patternable epoxy having sufficient structural integrity to span the opening while not sagging into or over the opening. This argument, however, is unavailing. As identified by the Examiner, Subramanian depicts a layer over an opening. (Ans. 3, 7 (citing Subramanian Fig. 4d).) While Subramanian‟s layer does not comprise a photolithographically patternable epoxy, Gelorme cures this deficiency. Namely, Gelorme‟s photoresist layer includes precisely the same material, SU-8, as disclosed in the present Specification. (Ans. 4, 8-9 (comparing Gelorme col. 4, l. 7 and Examples 1-7 with Spec. ¶ 0016).) Moreover, as correctly pointed out by the Examiner, Appellants‟ Specification recognizes that the material of Gelorme, SU-8, is a material having sufficient structural Appeal 2010-005333 Application 11/502,277 7 integrity to span the opening while not sagging into or over the opening. (Ans. 4.) Therefore, we agree with the Examiner that Gelorme satisfies this limitation. Appellants further quote claim 14‟s language and make blanket, conclusory statements, without any support, that the cited prior art does not teach these claim limitations. (App. Br. 43-44; Reply Br. 13-14.) This form of argument is ineffective in demonstrating error in the Examiner‟s findings or legal conclusions to establish the patentability of the claims on appeal. See Ex parte Belinne, No. 2009-004693, slip op. at 7-8 (BPAI Aug. 10, 2009) (informative); see also 37 C.F.R. § 41.37(c)(1)(vii) (holding that a statement that merely points out what a claim recites will not be considered an argument for separate patentability of the claim). Finally, we are not persuaded by Appellants that the combination of Subramanian and Gelorme is improper. First, as outlined in detail above, we agree with the Examiner that the cited combination teaches or suggests the limitations of claim 14. Thus, we disagree with Appellants that any claim limitations are missing. Next, we remain unpersuaded of nonobviousness by Appellants‟ remaining arguments regarding the combination of Subramanian and Gelorme. Appellants argue that there is no incentive, teaching or suggestion in the references to produce the claimed invention (App. Br. 44). However, satisfying the teaching, suggestion, or motivation test is only one way to demonstrate obviousness. See KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398 (2007). It is now well established that alternative reasoning may be used. For example, a combination may be obvious when, as here, it is merely the combination of familiar elements according to known methods to yield Appeal 2010-005333 Application 11/502,277 8 predictable results. Leapfrog Enters., Inc. v. Fisher-Price, Inc., 485 F.3d 1157, 1161 (Fed. Cir. 2007) (citing KSR, 550 U.S. at 416). In the present case, the Examiner first factually identifies that each of the limitations is taught by either Subramanian or Gelorme. (Ans. 3, 7-9.) Then, the Examiner determines that the combination would have been obvious because it was merely the combination of known elements to achieve predictable results. (Ans. 3-4, 10.) More specifically, the Examiner articulates that skilled artisans would combine the references because Subramanian specifically contemplates the use of a photoresist for the etch- stop layer and a skilled artisan would consider other photoresist materials, such as Gelorme‟s improved non-brittle and non-distortable photoresist. (Ans. 10.) Appellants fail to provide any persuasive evidence or arguments to rebut these findings. While Appellants assert that Gelorme is directed to a wholly different field and art, the only distinction identified by Appellants is that Gelorme is directed to a process of manufacturing a circuit board. To the contrary, Gelorme is more generally directed to photoresist compositions. (See Gelorme col. 1, ll. 10-13.) Subramanian, as well as the present application, describes the use of a photoresist and, as explained by the Examiner, a skilled artisan would consider other known photoresist materials. (Ans. 10.) Thus, merely stating that Gelorme‟s photoresist can be used in manufacturing a printed circuit board fails to explain why a skilled artisan would discount the known photoresist composition of Gelorme in view of the Subramanian reference. Therefore, based upon the record before us, Appellants have not rebutted the prima facie case of obviousness presented by the Examiner. Appeal 2010-005333 Application 11/502,277 9 Accordingly, we find no error in the Examiner‟s findings and sustain the obviousness rejection of claim 14. Claims 16, 19, 20, 24, and 26-28 Because Appellants present the same arguments with respect to claims 16, 19, 20, 24, and 26-28 (App. Br. 41-46), we also sustain the Examiner‟s obviousness rejection of claims 16, 19, 20, 24, and 26-28 (Ans. 3-10) for the reasons noted above. THE OBVIOUSNESS REJECTION OF CLAIM 15 Claim 15 We also sustain the obviousness rejection of claim 15. (Ans. 4-5, 10- 11.) Appellants argue that Parker does not disclose a sealing layer because the seal layer identified by the Examiner is compressible. (App. Br. 34.) We do not address this argument because we find that Subramanian itself discloses a sealing layer. (See Subramanian Fig. 4d, item 32.) Note that in sustaining a multiple-reference rejection under 35 U.S.C. § 103(a), the Board may rely on a subset of the cited references without designating the affirmance as a new ground of rejection. In re Boyer, 363 F.2d 455, 458 n.2 (CCPA 1966) (citing In re Bush, 296 F.2d 491, 496 (CCPA 1961)). THE REMAINING OBVIOUSNESS REJECTIONS Claims 17, 18, 21-23, and 25 Because Appellants present the same arguments with respect to claims 17, 18, 21-23, and 25 (App. Br. 52-66), we also sustain the Examiner‟s Appeal 2010-005333 Application 11/502,277 10 obviousness rejections of claims 17, 18, 21-23, and 25 (Ans. 5-7, 11-12) for the reasons noted above. DECISION The Examiner‟s decision rejecting claims 14-28 is affirmed. AFFIRMED Babc Copy with citationCopy as parenthetical citation